High strength photonic crystal membrane and manufacture method therefor

A photonic crystal, high-strength technology, applied in optics, optical components, instruments, etc., can solve the problems of photonic crystal structure damage, limited monomers that can be photo-initiated polymerization, etc., and achieve a strong practical effect

Active Publication Date: 2017-03-29
DALIAN UNIV OF TECH
View PDF5 Cites 21 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] Although the above two methods can realize the preparation of high-intensity photonic crystal films, the first method requires the synthesis of specific core-shell structure microspheres, and most of them are assembled units of organic materials; the second method is more commonly used, but can The monomers for photoinitiated polymerization are limited, and the process of pouring monomers into the assembled photonic crystals will lead to partial destruction of the photonic crystal structure

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High strength photonic crystal membrane and manufacture method therefor
  • High strength photonic crystal membrane and manufacture method therefor
  • High strength photonic crystal membrane and manufacture method therefor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0030] Preparation of CdS / nitrovarnish high-intensity photonic crystal films.

[0031] Firstly, monodisperse CdS colloidal microspheres are prepared, and the specific preparation method is as follows:

[0032] Weigh 0.6 g of polyvinylpyrrolidone powder (PVP), add 30 mL of diethylene glycol, and then add a certain amount of cadmium nitrate and thiourea powder to make the concentration of cadmium nitrate and thiourea 0.1 M, and stir until all the powders are completely dissolved. The solution was heated to 150° C., incubated for 1 h, and then cooled to room temperature naturally. The product was centrifuged, washed with water three times, and dried.

[0033] A certain amount of monodispersed CdS microsphere powder was weighed, and absolute ethanol was added to prepare a dispersion liquid with a concentration of 10 wt%.

[0034] A certain amount of nitro varnish was dropped on the cleaned glass sheet, and it was used as an assembly substrate after natural drying at room temperat...

Embodiment 2

[0038] Preparation of CdS / PMMA high-strength photonic crystal films.

[0039] The CdS dispersion in Comparative Example 1 was used for the preparation of photonic crystal films. PMMA was used as the polymer component, and the solution was dissolved in THF to prepare a solution with a mass fraction of 20%, which was added dropwise to a glass plate after natural drying at room temperature for 0.5h as an assembly. base use. The ethanol dispersion of CdS microspheres was dropped on the partially dried PMMA film to completely cover the surface of the polymer film, and the whole was placed on a heating plate with a temperature of 80 °C. After the solvent was completely evaporated, high strength was obtained. Photonic crystal film.

[0040] figure 1 The scanning electron microscope images of the photonic crystal film obtained by the direct assembly of CdS microspheres in Example 1 and the photonic crystal film wrapped in the nitro varnish film, as shown in the figure, when there is...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle diameteraaaaaaaaaa
Login to view more

Abstract

The invention discloses a high strength photonic crystal membrane and a manufacture method therefor and belongs to the field of new material manufacture. According to the photonic crystal membrane, dispersion liquid containing monodisperse nanometer microspheres is added drop by drop on a part of a dry polymer membrane surface; as a solvent volatilizes, polymers are led into gaps among the microspheres so as to form a continuous structure when the microspheres are self-assembled into photonic crystals, and therefore the high strength photonic crystal membrane can be manufactured in one step. The method is simple and safe in procedures, the photonic crystals and polymeric materials that are excellent in performance in production practice can be directly composited, and therefore a functional photonic crystal membrane can be manufactured; the method is strong in expansibility and has wide application prospects for application to equipment such as display devices, sensing devices, decoration devices and the like.

Description

technical field [0001] The invention relates to the field of photonic crystal materials, in particular to a high-strength photonic crystal film and a preparation method thereof, and belongs to the field of new material research. Background technique [0002] Photonic crystal is a structure formed by periodic arrangement of two materials with different refractive indices in space. This structural feature enables it to modulate the passage of light, that is, to selectively prohibit the passage of light of a specific wavelength through the photon forbidden band. . According to the number of directions of periodic changes in refractive index, photonic crystals are divided into one-dimensional, two-dimensional and three-dimensional photonic crystals. Among them, three-dimensional photonic crystals are usually self-assembled by monodisperse microspheres, and the preparation is relatively simple, so it has attracted the attention of many researchers. Since there is only point cont...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/00
CPCG02B1/005
Inventor 武素丽常杰苏昕张淑芬
Owner DALIAN UNIV OF TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap