A kind of preparation method of gallium arsenide-silicon multi-junction high-efficiency solar cell
A technology of solar cells and gallium arsenide, applied in the field of solar cells, can solve the problems of high cost, achieve the effects of saving costs, improving photoelectric conversion efficiency, and reducing process difficulty
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[0050] In order to further understand the invention content, characteristics and effects of the present invention, the following examples are given, and detailed descriptions are as follows in conjunction with the accompanying drawings:
[0051] see figure 1 , a method for preparing a gallium arsenide-silicon multi-junction high-efficiency solar cell, comprising:
[0052] 1. Preparation of single-junction Si (1.12eV) solar cells:
[0053] a. Use a P-type doped Si substrate with a thickness of 150-500 μm and a doping concentration of 1×10 15 ~1×10 18 cm -3 .
[0054] b. Use standard RCA solution silicon wafers for surface treatment to remove surface impurities;
[0055] c. Prepare the Si sub-cell 7 by means of diffusion or ion implantation, the PN junction depth of the Si sub-cell 7 is 0.3-0.8 μm; the forbidden band width of the Si sub-cell is 1.12 eV;
[0056] 2. Preparation of double-junction GaInP (1.88eV) / InGaAs (1.41eV) solar cell (the solar cell includes two parts o...
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