Method for manufacturing TFT substrate, organic EL display device, and liquid crystal display device
A manufacturing method and substrate technology, which are applied to lighting devices, chemical instruments and methods, organic cleaning compositions, etc., can solve problems such as increased use, and achieve the effects of excellent peeling solution resistance, improved peeling and removability, and high sensitivity.
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Embodiment 1～ Embodiment 84 and comparative example 1～ comparative example 68
[0619] After forming an organic film on a TFT substrate using curable compositions shown in Table 3 to Table 10, ITO or SiN x Any of them was used as an inorganic film, and a resist layer was further formed to prepare samples of Examples 1 to 84 and Comparative Examples 1 to 68. Then, using the stripping liquid composition having the composition shown in Table 11 to Table 18, the samples of these respective examples or comparative examples were stripped and removed of the resist layer, and the resist layer residue (etching) was carried out. residue) evaluation.
[0620] The stripping liquid composition used was prepared as follows. In addition, sensitivity, stripping liquid resistance, and etching residue were evaluated as mentioned later.
[0621] [table 3]
[0622]
[0623] [Table 4]
[0624]
[0625] [table 5]
[0626]
[0627] [Table 6]
[0628]
[0629] [Table 7]
[0630]
[0631] [Table 8]
[0632]
[0633] [Table 9]
[0634]
[0635] [Table...
Embodiment 101
[0702] In Japanese Patent No. 3321003 figure 1 In the active matrix type liquid crystal display device described in , the cured film 17 was formed as an interlayer insulating film in the following manner, and the liquid crystal display device of Example 101 was obtained. That is, using the curable composition of Example 1, cured film 17 was formed as an interlayer insulating film. Furthermore, after patterning the pixel electrode 4 of the upper layer of the cured film 17 through an etching resist, the said etching resist was peeled and removed using the stripping liquid composition of Example 1 after that.
[0703] As a result of applying a drive voltage to the obtained liquid crystal display device, it was found that it exhibited favorable display characteristics and was a highly reliable liquid crystal display device.
Embodiment 102
[0705] Only the following coating process was changed to obtain the same liquid crystal display device as in Example 101. That is, after applying the curable composition of Example 1 by the slit coating method, heating was performed on a hot plate at 90° C. for 120 seconds to remove the solvent and form a curable composition layer with a film thickness of 3.0 μm. . The obtained coating film was flat and had a good surface shape without unevenness. In addition, the performance as a liquid crystal display device was also good as in Example 101.
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