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Method for preparing black titanium dioxide powder by pulse laser sputtering deposition under negative-pressure environment

A black titanium dioxide, pulsed laser sputtering technology, applied in titanium dioxide, chemical instruments and methods, titanium oxide/hydroxide and other directions, can solve the problems of low preparation efficiency, complex preparation method of black titanium dioxide, etc., achieve simple operation, widen light Response range, risk reduction effect

Inactive Publication Date: 2017-05-31
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] Aiming at the problem that the preparation method of black titanium dioxide is complicated and the preparation efficiency is low, the present invention proposes a method for preparing black titanium dioxide by pulse laser sputtering deposition method in a vacuum environment

Method used

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  • Method for preparing black titanium dioxide powder by pulse laser sputtering deposition under negative-pressure environment
  • Method for preparing black titanium dioxide powder by pulse laser sputtering deposition under negative-pressure environment
  • Method for preparing black titanium dioxide powder by pulse laser sputtering deposition under negative-pressure environment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] Embodiment 1: the preparation of black titanium dioxide powder, step is:

[0019] Use a tablet press to press the purchased anatase-type white titanium dioxide into a circular target with a diameter of 2 cm and a thickness of 2 mm, with a pressure of 200 MPa; place the circular target in a vacuum tank, and vacuumize the vacuum tank. The internal pressure is 1×10 3 Pa; adjust the angle between the incident laser beam of the pulse laser and the circular target to be 10°, the substrate of the pulse laser is selected as a high temperature resistant quartz substrate or K9 glass substrate, adjust the substrate base and the circular target The distance between the materials is 25mm to ensure that the product can be deposited on the substrate by sputtering; turn on the pulse laser, adjust the laser pulse width of the pulse laser to 8ns, the wavelength to 1064nm, the energy to 950mJ, and the frequency to 10Hz; the laser focus is 2mm in diameter The light spot irradiates the whi...

Embodiment 2

[0021] Embodiment 2: the preparation of black titanium dioxide powder, step is:

[0022] Use a tablet press to press the purchased anatase-type white titanium dioxide into a circular target with a diameter of 2 cm and a thickness of 1 mm, with a pressure of 160 MPa; place the circular target in a vacuum tank, and vacuumize the vacuum tank. The internal pressure is 1×10 -3 Pa; adjust the angle between the incident laser beam of the pulse laser and the circular target to be 45°, the substrate of the pulse laser is selected as a high temperature resistant quartz substrate or K9 glass substrate, adjust the substrate base and the circular target The distance between the materials is 40mm to ensure that the product can be deposited on the substrate by sputtering; turn on the pulse laser, adjust the laser pulse width of the pulse laser to 10ns, the wavelength to 1064nm, the energy to 500mJ, and the frequency to 15Hz; the laser focus is 1mm in diameter The light spot irradiates the w...

Embodiment 3

[0023] Embodiment 3: the preparation of black titanium dioxide powder, step is:

[0024] Use a tablet press to press the purchased anatase-type white titanium dioxide into a circular target with a diameter of 3cm and a thickness of 3mm, and the pressure is 140MPa; place the circular target in a vacuum tank, and vacuumize the vacuum tank. The internal pressure is 1×10 -6 Pa; adjust the angle between the incident laser beam of the pulse laser and the circular target to be 15°, the substrate of the pulse laser is a quartz substrate, and adjust the distance between the substrate base and the circular target to be 15mm to ensure that the product can Sputtering deposition on the substrate; turn on the pulse laser, adjust the pulse width of the pulse laser to 50ns, the wavelength to 532nm, the energy to 450mJ, and the frequency to be 10Hz; the laser is focused to a spot with a diameter of 1mm to irradiate the white titanium dioxide in the vacuum tank. For a circular target, the irra...

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Abstract

The invention discloses a method for preparing black titanium dioxide powder by pulse laser sputtering deposition under negative-pressure environment. The method comprises the following steps: firstly, white titanium dioxide powder is pressed as a piece to obtain a target with the pressure of 140-200 Mpa; then, the target is put in a vacuum tank, and the vacuum tank is vacuumized to reach the internal pressure of 1*10-6-1*104 Pa; an angle between an incident laser beam of a pulse laser and the target is adjusted within 10-45 degrees, and a distance from a substrate of the laser to the target is 15-50 mm; and the pulse laser is started, the laser pulse width, the laser energy, the laser wave length and the frequency are adjusted, the target in the vacuum tank is focused and irradiated by laser for a certain time to obtain a black titanium dioxide film on the substrate, and black titanium dioxide on the black titanium dioxide film is scraped off to obtain the black titanium dioxide powder. The method is simple and fast in preparation process, low in raw material cost and short in reaction time.

Description

technical field [0001] The invention belongs to the technical field of inorganic material preparation, and in particular relates to a method for preparing black titanium dioxide powder or film by pulse laser sputtering deposition method in a vacuum environment. Background technique [0002] Titanium dioxide, as a widely used semiconductor catalyst, can currently be used in solar cells, photocatalytically splitting water to release hydrogen and oxygen, and can also be used to degrade environmental pollutants. Since titanium dioxide is a wide-bandgap semiconductor (3.0-3.2eV), it can only absorb the ultraviolet region in the solar spectrum, and this part is only 3% to 5% of the entire solar energy, which greatly reduces the application range and catalytic efficiency of titanium dioxide. . Therefore, in order to improve the photocatalytic activity of titanium dioxide, it is necessary to enhance its absorption of visible light and broaden its photoresponse range. [0003] In o...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/08C23C14/28C01G23/07B01J21/06
CPCC23C14/083C23C14/28C01G23/07B01J21/063B01J35/39
Inventor 魏强卢红黄欢欢张立宪
Owner TIANJIN UNIV
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