Method for preparing titanium dioxide pattern without residue layer by room-temperature transfer impressing technology

A technology with no residual layer and titanium dioxide, which is applied in photomechanical equipment, patterned surface photoengraving process, optics, etc., can solve the problems of limited application of TiO2, complicated process, difficult preparation, etc., and achieves low requirements for reaction equipment and mild conditions. Easy-to-control, easy-to-use effects

Active Publication Date: 2017-05-31
JIANGNAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the above-mentioned patterning method generally has a complicated process, and requires special instruments and equipment, making it difficult to achieve large-scale preparation; at the same time, the TiO 2 There is a residual layer in the pattern, which limits the patterned TiO 2 Applications

Method used

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  • Method for preparing titanium dioxide pattern without residue layer by room-temperature transfer impressing technology
  • Method for preparing titanium dioxide pattern without residue layer by room-temperature transfer impressing technology
  • Method for preparing titanium dioxide pattern without residue layer by room-temperature transfer impressing technology

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Step 1: Preparation of precursor solution

[0027] Dissolve polymethyl methacrylate (PMMA) solid in acetone solution with ultrasonic heating, prepare a PMMA solution with a mass concentration of 2.5%, and mix it with an equal volume of 0.5mol / L n-tetrabutyl titanate ethanol solution to prepare Precursor.

[0028] Step 2: Preparation of soft template

[0029] Weigh the prepolymer of polydimethylsiloxane (PDMS) and initiator, the mass ratio is 10:1, stir and mix; then cast on a silicon template with a strip width of 3 μm and a spacing of 1 μm, at 60 ° C Curing in an environment; After curing, the PDMS is separated from the silicon template to obtain a PDMS soft template.

[0030] Step 3: Spin coating precursor solution on soft template surface

[0031] Under the conditions of rotation speed of 4000rpm and rotation time of 30s, the precursor solution was spin-coated on the surface of the PDMS soft template to obtain a PDMS soft template with a composite film on the surf...

Embodiment 2

[0039] Step 1: Preparation of precursor solution

[0040] Dissolve polymethyl methacrylate (PMMA) solid into acetone solution with ultrasonic heating, prepare a PMMA solution with a mass concentration of 1%, and mix it with an equal volume of 0.2mol / L n-tetrabutyl titanate ethanol solution to prepare Precursor.

[0041] Step 2: Preparation of soft template

[0042] Weigh the prepolymer of polydimethylsiloxane (PDMS) and initiator, the mass ratio is 10:1, stir and mix; then cast on the silicon template with a square width of 1 μm and a spacing of 1 μm, at 80 ° C Curing in the environment; after curing, the PDMS is separated from the silicon template to obtain a PDMS soft template.

[0043] Step 3: Spin coating precursor solution on soft template surface

[0044] Under the conditions of rotation speed of 6000rpm and rotation time of 30s, the precursor solution was spin-coated on the surface of the PDMS soft template to obtain a PDMS soft template with a composite film on the ...

Embodiment 3

[0052] Step 1: Preparation of precursor solution

[0053] Solid polystyrene (PS) was heated and dissolved in acetone solution by ultrasonic heating to prepare a PS solution with a mass concentration of 1.5%, and mixed with an equal volume of 0.5 mol / L n-tetrabutyl titanate ethanol solution to prepare a precursor solution.

[0054] Step 2: Preparation of soft template

[0055]Weigh the prepolymer of polydimethylsiloxane (PDMS) and the initiator, the mass ratio is 10:1, stir and mix; then cast on the silicon template with a square width of 1 μm and a spacing of 1 μm, at 60 ° C Curing in the environment; after curing, the PDMS is separated from the silicon template to obtain a PDMS soft template.

[0056] Step 3: Spin coating precursor solution on soft template surface

[0057] Under the conditions of rotation speed of 4000rpm and rotation time of 30s, the precursor solution was spin-coated on the surface of the PDMS soft template to obtain a PDMS soft template with a composite...

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Abstract

The invention relates to a method for preparing a titanium dioxide pattern without a residue layer by a room-temperature transfer impressing technology. The method comprises the following steps: (1) mixing a thermoplastic polymer solution and titanium dioxide sol or a titanium salt solution to prepare a precursor solution; (2) spin-coating or spray-coating the surface of a soft template with the precursor solution in the step (1) to form a composite film, wherein the surface of the soft template has a convex-concave structure; (3) contacting the soft template obtained in the step (2) and a hydrophilic base at room temperature, and transferring the composite film to the surface of the base; (4) calcining the sample obtained in the step (3), and cooling to room temperature; (5) putting the sample obtained in the step (4) into a mixed solution of titanium salt, concentrated hydrochloric acid and water, and forming the titanium dioxide pattern without the residue layer on the surface of the base under the hydrothermal condition. The invention relates to the technical field of micro-nano processing of materials. The titanium dioxide pattern without the residue layer is prepared on planar and curved bases by the room-temperature transfer impressing technology.

Description

technical field [0001] The invention relates to the technical field of micro-nano processing of materials, in particular to a method for preparing a residual-layer-free titanium dioxide pattern by using a room-temperature reverse embossing technique. Background technique [0002] Titanium dioxide (TiO 2 ) is an excellent semiconductor material with many good properties, such as non-toxic and harmless, stable chemical properties, high photoelectric conversion efficiency, low preparation cost, etc. It is patterned in sensors, solar cells, photocatalysis, biological, etc. fields have a wide range of applications. [0003] Currently, the preparation of patterned TiO 2 The methods are: photolithography technology, electron beam etching technology, self-assembly technology, scanning probe technology, nanoimprint technology and so on. CN1785683 reported a method for preparing patterned titania microstructure with a flat substrate as a base and a titania sol as a raw material; CN...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/00
CPCG03F7/0002
Inventor 石刚车友新李赢王大伟倪才华王利魁桑欣欣
Owner JIANGNAN UNIV
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