Method for improving light extraction from OLED light-emitting devices through optical films
A technology for optical thin films and light-emitting devices, which is applied in the manufacture of semiconductor devices, electrical solid-state devices, semiconductor/solid-state devices, etc., to achieve the effects of increased light extraction rate, low manufacturing cost, and improved light extraction efficiency
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[0032] In this example, see figure 1 with image 3 , a method for improving the light extraction of an OLED light-emitting device through an optical film, characterized in that the steps are as follows:
[0033] a. Using a glass substrate as a substrate, sputtering high-conductivity ITO on the glass substrate with a thickness of 180nm as the anode electrode layer;
[0034] b. Evaporate MoO on the anode electrode layer prepared in the step a 3 , with a thickness of 5nm, used as an interface modification layer; its work function is between ITO and NPB, which can reduce the potential barrier between ITO and NPB, so that holes can be transported to the light-emitting layer more quickly, and the electron-hole compound rate;
[0035] c. On the interface modification layer prepared in the step b, the NPB layer with a thickness of 60nm and the Alq layer with a thickness of 60nm are successively evaporated. 3layer, a LiF layer with a thickness of 0.8nm and an Al layer with a thickn...
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