LED full-color display device structure based on III-V-group nitride semiconductor and manufacturing method
A nitride semiconductor, full-color display technology, used in semiconductor/solid-state device manufacturing, semiconductor devices, electric solid-state devices, etc., can solve the problems of inability to accurately restore grayscale, low resolution of color displays, and high device operating voltage.
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Embodiment 1
[0119] see Figure 1 to Figure 3 The present invention provides an LED full-color display device structure based on III-V nitride semiconductors, and the LED full-color display device structure based on III-V nitride semiconductors includes: an active matrix driving silicon substrate backplane 1 , the active matrix driving silicon-based backplane 1 includes several driving units 11, and each of the driving units 11 includes an anode (not shown) and a common cathode (not shown); an LED micro-pixel array, so The LED micro-pixel array is located on the surface of the active matrix driving silicon base backplane 1, and includes several LED micro-pixels 2; the LED micro-pixels 2 are distributed in an array on the surface of the active matrix driving silicon substrate 1; The LED micro-pixels 2 all include a luminescent material layer 21 and an anode 22. The anodes 22 of each of the LED micro-pixels 2 are located on the surface of the active matrix driving silicon-based backplane 1, ...
Embodiment 2
[0146] see Figure 8 , the present invention also provides a preparation method of an LED full-color display device structure based on III-V nitride semiconductors, and the preparation method is suitable for preparing the LED full-color display device structure described in Embodiment 1. The preparation method of the LED full-color display device structure of the III-V nitride semiconductor comprises the following steps:
[0147] 1) providing a growth substrate, and sequentially growing a buffer layer, a first conductivity type III-V group nitride layer, a quantum well layer and a second conductivity type III-V group nitride layer on the surface of the growth substrate;
[0148] 2) selectively etching the second conductivity type III-V group nitride layer and the quantum well layer until the first conductivity type III-V group nitride layer is exposed to form a micro LED mesa array;
[0149] 3) forming an anode on the surface of the second conductive type III-V group nitride ...
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