Controllable preparation method of light responsive surface crepe micro-structure
A light-responsive, micro-structured technology, applied in photomechanical equipment, patterned photoplate process, photosensitive materials used in optomechanical equipment, etc., to achieve simple operation, avoid operation steps, and controllable time and space at the same time Effect
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Embodiment 1
[0022] A controllable preparation method of a photoresponsive surface wrinkle microstructure, comprising the following steps:
[0023] Step 1, mix the PDMS prepolymer and crosslinking agent Sylgard184 (purchased from Dow Corning, USA) at a mass ratio of 10:1, and fully stir with a glass rod to form a uniform prepolymer; After degassing in a multi-purpose vacuum pump for 1 hour, pour it into a watch glass; heat at 70°C for 4 hours to cure; obtain a PDMS soft substrate;
[0024] Step 2. The PDMS soft substrate obtained in step 1 is subjected to oxygen plasma surface activation treatment, and then spin-coated with a chloroform solution of 1wt% polymethylmethacrylate (PMMA) (spin-coating parameters: 4000rpm, 60s), and degassed in a vacuum pump Remove residual organic solvent to obtain PDMS / PMMA soft and hard composite system.
[0025] Step 3: Heat the PDMS / PMMA composite system obtained in Step 2 at 100°C for 1 hour, and cool to room temperature with the furnace to obtain a maze-...
Embodiment 2
[0030] A controllable preparation method of a light-responsive surface wrinkle microstructure, the preparation process of which is basically the same as that of Example 1, the only difference being:
[0031] In step 2, the degradable polymer is changed from PMMA to poly-L-lactic acid (PLLA), and the spin coating speed is changed from 4000rpm to 5000rpm to obtain a PDMS / PLLA soft-hard composite system;
[0032] In step 3, the heating temperature was changed from 100°C to 90°C, and the wrinkled pattern on the surface of the PDMS / PLLA soft-hard composite system was as follows: Figure 4 As shown in the optical microscope diagram;
[0033] In step 4, the stamped photomask is made of figure 2 The photomask 1 shown is changed as Figure 5 Photomask 2 shown, light dose from 0-13.2J cm -2 Change to 0-19.2J cm -2 , so as to control the amplitude of the wrinkle topography in the exposed area A (measured by atomic force microscope), as shown in Table 2; meanwhile, the wrinkles along...
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