Semiconductor element and method for manufacturing the same
A manufacturing method and semiconductor technology, applied in semiconductor devices, electrical components, electrical solid-state devices, etc., can solve the problems of reducing image resolution and increasing noise, and achieve the effects of improving image resolution, reducing optical path difference, and reducing noise.
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[0053] The present invention will be described more fully with reference to the accompanying drawings of this embodiment. However, the present invention can also be embodied in various forms and should not be limited to the embodiments described herein. In the drawings, the thicknesses of layers and regions may be exaggerated for clarity. The same or similar reference numerals denote the same or similar elements, and the following paragraphs will not repeat them one by one.
[0054] figure 1 is a schematic cross-sectional view of a semiconductor device according to the first embodiment of the present invention. Figure 2A yes figure 1 Partially enlarged cross-sectional schematic diagram. Figure 2B yes Figure 2A The refractive index distribution diagram.
[0055] Please refer to figure 1 , the semiconductor device 10 according to the first embodiment of the present invention includes a substrate 100 , a sensor 102 , a dielectric layer 104 and a light pipe structure 108...
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