Water vapor thermal plasma cracking treatment method of asphaltenes
A technology of thermal plasma and cracking treatment, which is used in hydrocarbon cracking to produce hydrocarbons, carbon preparation/purification, and organic chemistry.
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Embodiment 1
[0029] Asphaltene raw material is in the form of high temperature liquid phase, through CH 4 The atomized transport enters the thermal plasma reactor. The thermal plasma torch uses water vapor as the working gas, the input power is 2MW, the water vapor flow rate used by the thermal plasma torch is 150kg / h, the average temperature of the plasma exceeds 3500K, and the temperature in the central area is 5000-6000K. The feed rate of the asphaltene raw material is 600kg / h, and the CH 4 Gas volume is 12kg / h. The pyrolysis product temperature is 1500~2000K, and the pyrolysis product enters the rapid separation device (the gas-solid separation device disclosed in the patent CN1267564 in the prior art), the gas residence time is 80ms, and the solid phase residence time is 75% of the separation efficiency. The output is 220kg / h. The gas separated at the gas outlet, that is, the gas-phase intermediate product, enters the quenching device, is rapidly cooled with circulating water, and ...
Embodiment 2
[0031] The asphaltene raw material is transported into the thermal plasma reactor through Ar atomization in the form of high-temperature liquid phase. The thermal plasma torch uses water vapor as the working gas, the input power is 2.5MW, the water vapor flow rate used by the thermal plasma torch is 200kg / h, the average temperature of the plasma exceeds 3500K, and the temperature in the central area is 5000-6000K. The feed rate of the asphaltene raw material is 600kg / h, and the delivery rate of Ar gas is 15kg / h. Carbon dioxide is fed into the reactor to adjust the ratio of carbon monoxide and hydrogen in the product synthesis gas, and the flow rate of the added carbon dioxide is 100kg / h. The pyrolysis product temperature is 1500~2000K, and the pyrolysis product enters the rapid separation device (the gas-solid separation device disclosed in the patent CN1267564 in the prior art), the gas residence time is 80ms, and the solid phase residence time is 75% of the separation effici...
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