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A method for regenerating positive photoresist of parts of lithography machine in yellow light process

A technology of yellow light process and parts, applied in the field of positive photoresist regeneration of parts of yellow light process lithography machine, can solve the problems of parts aging, poor cleaning effect of cleaning agent and high production cost

Active Publication Date: 2020-10-27
安徽高芯众科半导体有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] Lithography technology is to transfer the pattern on the photomask to PR first, and then dissolve or retain the part of PR exposed to light by soaking in a solvent to form a photoresist pattern that is identical or complementary to the photomask; the technology used in yellow light is Lithography technology, yellow light process means that the ambient lighting source of the lithography process uses yellow light, and the accuracy of the yellow light process line is high; the lithography machine (Mask Aligner) is also known as: mask alignment exposure machine, exposure system , lithography system, etc.; the optical cup is the core component of the lithography machine. If there is an abnormal defect after the lithography development, the photoresist layer needs to be cleaned and removed before re-lithography; the photoresist is divided into positive photoresist and negative photoresist. Positive photoresist plays a dominant role in the technical field. Most of the existing technologies use alkaline solvents to remove cured or liquid positive photoresist. The cleaning agent of this alkaline solvent formula has poor cleaning effect and will cause aging of parts. and corrosion; or use special cleaning equipment, high production costs

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  • A method for regenerating positive photoresist of parts of lithography machine in yellow light process
  • A method for regenerating positive photoresist of parts of lithography machine in yellow light process

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Embodiment Construction

[0019] Below in combination with Table 1, specific embodiments of the present invention will be described in detail.

[0020] Table 1 shows the condition parameters of each step of the positive photoresist regeneration method of a yellow light process photolithography machine part in Embodiment 1-6.

[0021] Each step reagent and parameter condition described in the embodiment of table 1

[0022]

[0023]

[0024] The method for regenerating the positive photoresist of the parts of the yellow-light process photolithography machine according to the present invention has the optimal soaking time of 2 hours, the rinsing liquid is acetone, the optimal rinsing time is 10 minutes, the optimal washing time is 30 minutes, and the ultra-clean drying temperature is optimal. The temperature is 60°C, and the time is 2h.

[0025] The method for regenerating the positive photoresist of a part of a yellow-light process photolithography machine described in Embodiment 1-6 includes the ...

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Abstract

The invention relates to the technical field of photoelectricity, in particular to a positive photoresist regeneration method for a part of a mask aligner during the yellow-light process. According to the positive photoresist regeneration method for the part of the mask aligner during the yellow-light process, positive photoresist of the part of the mask aligner during the yellow-light process is cleaned and removed for regeneration and use by combining conventional ketone organic solvents which are low in toxicity and even almost have no toxicity, three different types of ketone organic solvents are combined according to a scientific and reasonable proportion, the dissolving capacity and the evaporation rate of a compound solvent are greatly improved, the cleaning effect is good, a cleaning liquid is low in cost, and the method is friendly to an environment; and meanwhile, the the ketone organic solvents have reducibility, thus, corrosion and aging of a surface of the part can be prevented very well, the part can be prevented from being corroded and aged very well, the regeneration and usage effect of the part is ensured, and the application of the part cannot be affected. By using an immersion cleaning liquid and the regeneration method, the regeneration frequency of the positive photoresist of the part of the mark aligner during the yellow-light process can reach 100 times.

Description

technical field [0001] The invention relates to the field of optoelectronic technology, in particular to a method for regenerating the positive photoresist of parts of a photolithography machine for yellow light process. Background technique [0002] Lithography technology is to transfer the pattern on the photomask to PR first, and then dissolve or retain the part of PR exposed to light by soaking in a solvent to form a photoresist pattern that is identical or complementary to the photomask; the technology used in yellow light is Lithography technology, yellow light process means that the ambient lighting source of the lithography process uses yellow light, and the accuracy of the yellow light process line is high; the lithography machine (Mask Aligner) is also known as: mask alignment exposure machine, exposure system , lithography system, etc.; the optical cup is the core component of the lithography machine. If there is an abnormal defect after the lithography developmen...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/42
CPCG03F7/426
Inventor 范银波
Owner 安徽高芯众科半导体有限公司
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