A technology for improving the service life of etching solution

A chemical solution and life-span technology, applied in the field of etching, can solve the problems of reduced filling factor, increased dark current, reduced etching efficiency, etc., and achieves the effect of ensuring etching uniformity, prolonging service life, and increasing solubility.

Active Publication Date: 2019-11-05
TONGWEI SOLAR (ANHUI) CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] From the data in the table, it can be seen that the etching workshop A produces 18 million pieces, the life of the etching solution is at the end, the property of the etching solution deteriorates, the etching efficiency is reduced, and the open circuit voltage is reduced, resulting in a decrease in the short-circuit current, a increase in the series resistance, and a parallel connection. The decrease in resistance leads to a decrease in fill factor, etc., and the increase in dark current directly affects the electrical properties of its products.

Method used

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  • A technology for improving the service life of etching solution
  • A technology for improving the service life of etching solution
  • A technology for improving the service life of etching solution

Examples

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Embodiment 1

[0026] A process for improving the service life of etching liquid, comprising the following steps:

[0027] Step 1): Add 2% by mass neutral salt to the etching liquid with low chemical activity, and simultaneously add 13‰ ethoxylate, mix and stir evenly;

[0028] SiF in the etching solution 6 2- The general formula for the reaction of anion and magnetic cation for neutral salt hydrolysis is as follows:

[0029] H in etching solution + The general formula for the reaction of cations and anions in neutral salt hydrolysis is as follows:

[0030] Step 2): The mixed solution after stirring is 20kHz cavitation through the magnetic field strength, and then the precipitate in the solution after cavitation (X 2 ) (SiF 6 ) n Filter out, filter out the precipitate (X 2 ) (SiF 6 ) n After the solution passes through ion exchange resin again, obtains filtrate;

[0031] Step 3): adding deionized water to the filtrate in step 2) to form a new solution, keeping the pH value at...

Embodiment 2

[0037] A process for improving the service life of etching liquid, comprising the following steps:

[0038] Step 1): Add 9% by mass of neutral salt to the etching liquid with low activity of the liquid, and at the same time add ethoxylates with a mass of 25‰, mix and stir evenly;

[0039] SiF in the etching solution 6 2- The general formula for the reaction of anion and magnetic cation for neutral salt hydrolysis is as follows:

[0040] H in etching solution + The general formula for the reaction of cations and anions in neutral salt hydrolysis is as follows:

[0041]Step 2): it is 30kHz cavitation that the mixed solution after stirring is passed through the magnetic field intensity, and then the precipitate in the solution after cavitation (X 2 ) (SiF 6 ) n Filter out, filter out the precipitate (X 2 ) (SiF 6 ) n After the solution passes through ion exchange resin again, obtains filtrate;

[0042] Step 3): adding deionized water to the filtrate in step 2) to ...

Embodiment 3

[0047] A process for improving the service life of etching liquid, comprising the following steps:

[0048] Step 1): Add 15% by mass neutral salt to the etching solution with low activity of the solution, and simultaneously add 40‰ of ethoxylate, mix and stir evenly;

[0049] SiF in the etching solution 6 2- The general formula for the reaction of anion and magnetic cation for neutral salt hydrolysis is as follows:

[0050] H in etching solution + The general formula for the reaction of cations and anions in neutral salt hydrolysis is as follows:

[0051] Step 2): The mixed solution after stirring is subjected to cavitation with a magnetic field strength of 20 to 40 kHz, and then the precipitate in the solution after cavitation (X 2 ) (SiF 6 ) n Filter out, filter out the precipitate (X 2 ) (SiF 6 ) n After the solution passes through ion exchange resin again, obtains filtrate;

[0052] Step 3): adding deionized water to the filtrate in step 2) to form a new so...

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Abstract

The invention discloses a technology for prolonging the service life of etching liquor. The technology comprises the following steps: 1) adding 2%-15% of neutral salt into the etching liquor with low liquor activity, and meanwhile, adding 1.3%-4% of an oxethyl compound, wherein the reaction formula of SiF62-anion in the etching liquor and magnetic cation hydrolyzed in the neutral salt is as shown in the specification and the reaction formula of H<+> cation in the etching liquor and anion hydrolyzed in the neutral salt is as shown in the specification; 2) cavitating the uniformly stirred mixed solution in a magnetic field with strength of 20-40kHz, and then filtering out sediment (X2)(SiF6)n in the cavitated solution and making the solution with the sediment(X2)(SiF6)n filtered out pass through ion exchange resin, thereby acquiring filtrate; 3) adding deionized water into the filtrate acquired in the step 2) and keeping the pH value from 1.8 to 2.3. According to the technology, the service life of the etching liquor can be prolonged, the liquor activity can be guaranteed, the replacing period of the etching liquor can be prolonged and the isolating rate trend in the prolonging period of the service life thereof is stable.

Description

technical field [0001] The invention relates to the technical field of etching, in particular to a process for improving the service life of etching liquid. Background technique [0002] The etching process is hydrofluoric acid on the main component of glass SiO 2 The reaction produces fluorosilicic acid H 2 SiF 6 , specifically: SiO 2 +4HF→SiF 4 +2H 2 O; 3SiF 4 +3H 2 O→H 2 SiO 3 +2H 2 SiF 6 . At the end of the life of the etching solution, the activity of the etching solution is low, not as good as before, and the by-product fluosilicic acid is increasing, which has a certain impact on the edge-cutting effect. [0003] Through the same process conditions of the two etching workshops A and B, the electrical properties of the products etched with 8 million pieces and 18 million pieces were scientifically recorded. The specific data are as follows; [0004] Number of pieces produced Eta Uoc Isc FF Rs. Rsh IRev2 Etching workshop A 18...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C03C15/00
CPCC03C15/00
Inventor 朱军李龙庭陈霞王杰李刚
Owner TONGWEI SOLAR (ANHUI) CO LTD
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