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Photosensitive resin composition and its application

A technology of photosensitive resin and composition, which is applied in the fields of optics, optomechanical equipment, nonlinear optics, etc., and can solve the problems of color filter bubble display defects, defects, bubble display defects and contrast

Active Publication Date: 2020-08-14
CHI MEI CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the color filter produced by using the photosensitive resin composition of the prior art has the problems of bubble-like display defects and poor contrast
[0007] Therefore, how to overcome the problems of bubble-like display defects and poor contrast to meet the current industry requirements is the goal of research in the technical field of the present invention.

Method used

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  • Photosensitive resin composition and its application
  • Photosensitive resin composition and its application
  • Photosensitive resin composition and its application

Examples

Experimental program
Comparison scheme
Effect test

preparation example Construction

[0757] The photosensitive resin composition of the present invention is usually prepared by first dissolving the components other than the pigment (A) in the solvent (G) to prepare a liquid composition, and then adding the pigment (A) and mixing uniformly. The solvent (G) needs to be selected from soluble dyes (B), alkali-soluble resins (C), compounds (D) with ethylenically unsaturated groups, photoinitiators (E) and compounds with the structure shown in formula (1) (F), and need not interact with these ingredients and have appropriate volatility.

[0758] Based on the usage amount of the alkali-soluble resin (C) being 100 parts by weight, the usage amount of the solvent (G) is 500 parts by weight to 5000 parts by weight; preferably 800 parts by weight to 4500 parts by weight; more preferably 1000 parts by weight to 4000 parts by weight.

[0759] In addition, the solvent (G) can be the same as the solvent used to prepare the alkali-soluble resin (C), and will not be repeated ...

Synthetic example C-1-1

[0779] With 100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500mL four-neck flask, and the feeding rate was controlled at 25 parts by weight / minute, and the temperature was maintained at 100°C In the range of 110° C., after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt % can be obtained.

[0780] Then, 100 parts by weight of the above-mentioned mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, while adding 6 parts by weight of tetrahydrophthalic anhydride and 13 parts by weight of benzophenone tetracarboxylic dianhydride , and heated to 110°C to 115°C, and reacted for 2 hours ...

Synthetic example C-1-2

[0782] With 100 parts by weight of fluorene epoxy compound (model ESF-300, manufactured by Nippon Steel Chemical; epoxy equivalent 231), 30 parts by weight of acrylic acid, 0.3 parts by weight of benzyltriethylammonium chloride, 0.1 parts by weight of 2,6-di-tert-butyl-p-cresol and 130 parts by weight of propylene glycol methyl ether acetate were continuously added to a 500mL four-neck flask, and the feeding rate was controlled at 25 parts by weight / minute, and the temperature was maintained at 100°C In the range of 110° C., after 15 hours of reaction, a light yellow transparent mixed liquid with a solid content concentration of 50 wt % can be obtained.

[0783] Next, 100 parts by weight of the above mixed solution was dissolved in 25 parts by weight of ethylene glycol ether acetate, and 13 parts by weight of benzophenone tetracarboxylic dianhydride was added at the same time, and reacted at 90°C to 95°C for 2 hours, Next, add 6 parts by weight of tetrahydrophthalic anhydride ...

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Abstract

The present invention relates to a photosensitive resin composition and an application thereof. The photosensitive resin composition includes a pigment (A), a dye (B), an alkali-soluble resin (C), a compound (D) having an ethylenically unsaturated group, a light starting agent (E), a compound (F) having the structure shown in the formula (1) and a solvent (G). The color filter prepared according to the photosensitive resin composition of the present invention has the advantage of having no bubble-like display defects and has good contrast.

Description

technical field [0001] The invention relates to a photosensitive resin composition and the use of the photosensitive resin composition to manufacture color filters and liquid crystal display components. In particular, a photosensitive resin composition is provided, and the color filter made of the photosensitive resin composition has the advantages of no bubble display defect and good contrast. Background technique [0002] At present, color filters have been widely used in the fields of office equipment such as color liquid crystal displays, color facsimile machines, and color cameras. With the increasing market demand, the manufacturing technology of color filters is also tending to diversify. At present, manufacturing methods such as dyeing method, printing method, electroplating method and dispersion method have been developed, among which the dispersion method is the mainstream process. [0003] The process of the dispersion method is to disperse the coloring pigment i...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/027G03F7/004G02F1/1335
CPCG02F1/133514G03F7/004G03F7/027
Inventor 何维凯
Owner CHI MEI CORP