Polishing liquid applicable to AMOLED glass base plate

A glass substrate and polishing liquid technology, applied in the field of AMOLED, can solve the problems of unable to meet the large-scale production requirements of AMOLED glass substrate surface, difficult to control the surface quality of the substrate, environmental hazards, etc., achieve high utilization rate, reduce surface roughness, reduce The effect of small pollution

Inactive Publication Date: 2017-09-22
HEFEI HUIKE PRECISION DIE CO LTD
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Chemical etching needs to use strong acid, which is costly. If effective and reasonable treatment and recycling are not carried out, it will cause great harm to the environment. Moreover, it is difficult to control the surface quality of the substrate after thinning, and subsequent polishing treatment is still required
Due to the high requirements on surface quality and processing precision of AMOLED glass substrates, high thermal stability, good chemical corrosion resistance, few surface and internal defects, suitable thermal expansion coefficient, light weight and high strength, etc., the ultra-precision processing of the surface poses severe challenges. Challenge, the traditional ultra-precision processing technology of hard and brittle wafer substrate cannot meet the large-scale production requirements of AMOLED glass substrate surface

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] Example 1 A polishing solution suitable for AMOLED glass substrates, which is composed of the following raw materials in parts by weight: 4 parts of cerium oxide, 16 parts of silica sol, 7 parts of pH regulator, 15 parts of colloidal solution, 5 parts of surfactant 6 parts, 6 parts of oligopeptide, 35 parts of deionized water.

[0018] A preparation method for a polishing solution suitable for an AMOLED glass substrate, comprising the following steps:

[0019] (1) Take cerium oxide, add deionized water to mix and keep stirring until the solution does not precipitate;

[0020] (2) Add silica sol, colloidal solution and oligopeptide to the product obtained in step (1), and stir while adding until the solution is free of flocs;

[0021] (3) adding a pH regulator and deionized water to the product obtained in step (2), adding the pH regulator to adjust the pH of the solution to be 8-11;

[0022] (4) Add a surfactant to the product obtained in step (3), continue stirring t...

Embodiment 2

[0026] Embodiment 2 A polishing solution suitable for AMOLED glass substrates, which is composed of the following raw materials in parts by weight: 10 parts of cerium oxide, 34 parts of silica sol, 9 parts of pH regulator, 22 parts of colloidal solution, 12 parts of surfactant parts, 11 parts of oligopeptides, and 54 parts of deionized water.

[0027] A preparation method for a polishing solution suitable for an AMOLED glass substrate, comprising the following steps:

[0028] (1) Take cerium oxide, add deionized water to mix and keep stirring until the solution does not precipitate;

[0029] (2) Add silica sol, colloidal solution and oligopeptide to the product obtained in step (1), and stir while adding until the solution is free of flocs;

[0030] (3) adding a pH regulator and deionized water to the product obtained in step (2), adding the pH regulator to adjust the pH of the solution to be 8-11;

[0031] (4) Add a surfactant to the product obtained in step (3), continue s...

Embodiment 3

[0035] Example 3 A polishing solution suitable for AMOLED glass substrates, which is composed of the following raw materials in parts by weight: 7 parts of cerium oxide, 22 parts of silica sol, 8 parts of pH regulator, 19 parts of colloidal solution, and 10 parts of surfactant 8 parts, 8 parts of oligopeptide, 46 parts of deionized water.

[0036] A preparation method for a polishing solution suitable for an AMOLED glass substrate, comprising the following steps:

[0037] (1) Take cerium oxide, add deionized water to mix and keep stirring until the solution does not precipitate;

[0038] (2) Add silica sol, colloidal solution and oligopeptide to the product obtained in step (1), and stir while adding until the solution is free of flocs;

[0039] (3) adding a pH regulator and deionized water to the product obtained in step (2), adding the pH regulator to adjust the pH of the solution to be 8-11;

[0040] (4) Add a surfactant to the product obtained in step (3), continue stirr...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention discloses a polishing solution suitable for AMOLED glass substrates, which is composed of the following raw materials in parts by weight: 4-10 parts of cerium oxide, 16-34 parts of silica sol, 7-9 parts of pH regulator, and colloidal solution 15‑22 parts, 5‑12 parts of surfactant, 6‑11 parts of oligopeptide, 35‑54 parts of deionized water. The polishing liquid prepared by the invention has a high utilization rate, reduces the production cost, and simultaneously reduces the pollution of the waste liquid of the polishing liquid to the environment; the polishing liquid of the present invention has a high material removal rate for polishing glass substrates, and there is no obvious scratch on the glass surface after polishing. The surface roughness is lower than before polishing; the polishing slurry of the present invention effectively minimizes the defects of the size controlled by the high-sensitivity defect detector on the substrate surface, and has a prolonged polishing life. Production of polished substrates with improved quality is efficient and also beneficial in terms of environmental load and cost.

Description

technical field [0001] The invention relates to the technical field of AMOLED, in particular to a polishing solution suitable for AMOLED glass substrates. Background technique [0002] Flat-panel liquid crystal display technology is one of the fastest-growing high-tech fields in the 21st century. The glass substrate only accounts for about 6% of the cost of AMOLED raw materials, but it is the most important component, which has a great impact on the performance of the display. Key indicators such as resolution, light transmittance, weight and viewing angle of the display are closely related to the glass substrate. . In consumer IT products using AMOLED flat panel display technology, lightness and thinness are the two main core competitive elements. In order to achieve lightness and thinness, it is common to reduce the thickness of the glass substrate, so as to achieve the purpose of reducing thickness and weight at the same time. [0003] At present, there are two main th...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
CPCC09G1/02
Inventor 白航空
Owner HEFEI HUIKE PRECISION DIE CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products