A kind of metal mask preparation method resistant to boe corrosion

A metal mask and mask technology, which is applied in metal material coating process, vacuum evaporation plating, coating and other directions, can solve the problems of loss of graphic line accuracy, sample contamination, low efficiency, etc., to improve the accuracy of sample structure, The effect of reducing coating stress and simplifying the process flow

Active Publication Date: 2019-07-12
BEIJING INST OF AEROSPACE CONTROL DEVICES
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] (1) The preparation process of the multilayer film is complicated, and the operation process is very easy to pollute the sample and affect the adhesion of the film layer;
[0004] (2) Since the subsequent coating samples need to be subjected to photolithography to realize the transfer of structural graphics, in the process of corroding the multilayer metal film, the phenomenon of side undercutting will inevitably lead to the loss of graphic line accuracy;
[0005] (3) The preparation of multilayer film requires multiple coating processes, which is low in efficiency and high in cost, and is not suitable for mass production

Method used

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  • A kind of metal mask preparation method resistant to boe corrosion
  • A kind of metal mask preparation method resistant to boe corrosion

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preparation example Construction

[0032] Such as figure 1 As shown, the present invention proposes a metal mask preparation method resistant to BOE corrosion, the steps are as follows:

[0033] Step a: cleaning the target object to be coated;

[0034] Specifically: soak the target object in a cleaning solution mixed with concentrated sulfuric acid and hydrogen peroxide. The temperature of the mixed cleaning solution is 80-130°C, and the soaking time is 15-30 minutes. The mixture of concentrated sulfuric acid and hydrogen peroxide will produce a lot of bubbles (O 2 ) and release heat, the air bubbles will take away the dust and particle attachments on the surface of the target, the concentrated sulfuric acid will corrode the organic pollutants, and heating will help to clean the target thoroughly.

[0035] Step b: performing coating treatment on the target object after cleaning;

[0036] The main innovation of the present invention is concentrated in that: a single-layer Cr / Au mask is used for coating treat...

Embodiment 1

[0044] Step a, cleaning: put the quartz crystal substrate in H 2 o 2 : Concentrated H 2 SO 4 =1:3 ratio to prepare cleaning solution, heat to 110°C, soak for 20-30min, take out and wash with warm water.

[0045] Step b, coating: ①Put the cleaned and dried quartz crystal substrate into the sputter coater, and evacuate to 3E-7Torr; ②Heat the quartz crystal substrate to about 320°C; ③Flow Ar and N 2 , change N 2 The proportion of the volume occupied by A, B, C, D, E a total of 5 groups of comparative tests, A, B, C, D, E N 2 The volume ratios are 20%, 40%, 50%, 60% and 80% respectively, and the sputtering chamber pressure is kept at 5mTorr, the sputtering power is 150W, and a 30nm thick Cr film is plated; The chamber pressure is 10mTorr, the sputtering power is set to 200W, and the Au film coating with a thickness of 200nm is completed; ⑤ Cool down to room temperature naturally, and take out the coated quartz crystal substrate.

[0046] Place the quartz crystal substrates c...

Embodiment 2

[0048] Step a, cleaning: put the quartz crystal substrate in H 2 o 2 : Concentrated H 2 SO 4 =1:5 ratio to prepare cleaning solution, heat to 130°C, soak for 15-25min, take out and wash with warm water.

[0049]Step b, coating: ①Put the cleaned and dried quartz crystal substrate into the sputter coater, and evacuate to the set value of 1E-7Torr; ②Heat the quartz crystal substrate to about 240°C; ③Flow in Ar and N 2 , N 2 The volume ratio is 55%, keep the sputtering chamber pressure at 10mTorr, sputtering power at 150W, and complete the 20nm thick Cr film plating; Complete the 300nm thick Au film plating; ⑤ naturally cool to room temperature, take out the coated quartz crystal substrate.

[0050] Place the obtained quartz crystal substrate plated with a single-layer Cr / Au mask in BOE (40% HF solution: 40% NH 4 F solution = 1:2) in the corrosion solution, soak for 20 hours. According to the analysis of the corrosion results, the single-layer Cr / Au mask on the surface of t...

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Abstract

The invention relates to a preparation method of a BOE (Buffered Oxide Etch)-resistant metal mask, in particular to a preparation method of plating a BOE resistant metal mask layer on a quartz crystal. The method specifically comprises a washing step and a coating step. The method has the following obvious effects: (1) a BOE resisting process is performed with a single Cr / Au mask layer; (2) problems such as surface undercutting, swelling and even falling off after the etching of an existing Cr / Au mask layer are solved; (3) a transfer etching pattern of the single Cr / Au mask layer is high in accuracy, and the accuracy can be controlled to be within 1 microns; and (4) the preparation processes are simple and easily controlled, the preparation cost is low, and mass production can be carried out.

Description

technical field [0001] The invention belongs to a method for preparing a metal mask, in particular to a method for plating a BOE corrosion-resistant metal mask layer on a quartz crystal. Background technique [0002] Quartz crystal is a piezoelectric material with very good vibration frequency stability, and is often used in the preparation of sensitive structures such as quartz tuning forks in the inertial field. The processing of quartz crystal structure mainly adopts BOE wet etching process, which specifically includes the steps of quartz crystal cleaning, metal mask preparation, photolithography and BOE etching. BOE corrosion needs to immerse the coated quartz crystal in the corrosion solution for a long time, so the BOE corrosion resistance of the metal mask is the key to the formation of the structure. At present, the commonly used BOE corrosion-resistant metal mask mainly adopts the method of plating multi-layer film, which has the following disadvantages: [0003] ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/18C23C14/35C23C14/02C03C17/40
CPCC03C17/40C03C2217/255C03C2217/26C03C2218/156C03C2218/31C23C14/021C23C14/185C23C14/352
Inventor 马日红毕小伟梁德春马跃飞刘福民
Owner BEIJING INST OF AEROSPACE CONTROL DEVICES
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