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OLED display substrate and manufacturing method thereof, and display device

A technology for display substrates and manufacturing methods, which is applied in photolithographic process exposure devices, photolithographic process coating equipment, semiconductor/solid-state device manufacturing, etc., can solve problems such as reducing the yield rate of OLED display substrates and affecting the performance of display substrates, achieving The effect of improving the yield rate

Active Publication Date: 2017-10-27
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In the manufacturing process of the existing OLED display substrate, the anode of the display substrate is formed first, and then the pattern of the pixel defining layer is formed on the substrate formed with the anode. The pattern of the pixel defining layer has a plurality of openings that can expose the anode. After finishing the pattern of the pixel defining layer, it is necessary to make PS (separator post) on the pattern of the pixel defining layer. When making PS, it is necessary to coat the organic photosensitive material on the substrate. After the exposure and development process, these organic photosensitive materials are easy to remain. On the anode, it will affect the performance of the display substrate and reduce the yield of the OLED display substrate

Method used

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  • OLED display substrate and manufacturing method thereof, and display device
  • OLED display substrate and manufacturing method thereof, and display device
  • OLED display substrate and manufacturing method thereof, and display device

Examples

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Embodiment 1

[0085] In this embodiment, the isolation columns are formed first, and then the pattern of the pixel defining layer is formed. The manufacturing method of the OLED display substrate of this embodiment includes:

[0086] Step 1, providing a hard substrate 1, the hard substrate 1 can be a glass substrate or a quartz substrate;

[0087] Step 2, forming a flexible substrate 2 on the hard substrate 1, the flexible substrate 2 can be made of polyimide;

[0088] Step 3, forming a buffer layer 3 on the flexible substrate 2, the buffer layer 3 can be made of oxide, nitride or oxynitride;

[0089] Step 4, forming the pattern of the active layer 9 on the buffer layer 3;

[0090] Specifically, a layer of semiconductor material is deposited on the buffer layer 3, a layer of photoresist is coated on the semiconductor material, and a mask is used to expose the photoresist to form photoresist unretained regions and photoresist. Resist retention area, wherein, the photoresist retention area...

Embodiment 2

[0109] In this embodiment, the patterns of the isolation columns and the pixel defining layer are formed through one patterning process. The manufacturing method of the OLED display substrate of this embodiment includes:

[0110] Step 1, providing a hard substrate 1, the hard substrate 1 can be a glass substrate or a quartz substrate;

[0111] Step 2, forming a flexible substrate 2 on the hard substrate 1, the flexible substrate 2 can be made of polyimide;

[0112] Step 3, forming a buffer layer 3 on the flexible substrate 2, the buffer layer 3 can be made of oxide, nitride or oxynitride;

[0113] Step 4, forming the pattern of the active layer 9 on the buffer layer 3;

[0114] Specifically, a layer of semiconductor material is deposited on the buffer layer 3, a layer of photoresist is coated on the semiconductor material, and a mask is used to expose the photoresist to form photoresist unretained regions and photoresist. Resist retention area, wherein, the photoresist rete...

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Abstract

The invention provides an OLED display substrate and a manufacturing method thereof, and a display device, and belongs to the technical field of display. A manufacturing method for an OLED display substrate includes a step of forming a separation pillar on a substrate on which an anode is formed and a step of forming a pattern of a pixel defining layer, wherein the step of forming the separation pillar is no later than the step of forming the pattern of the pixel defining layer. The separation pillar may be formed before the step of forming the pattern of the pixel defining layer, or the separation pillar and the pattern of the pixel defining layer may be formed by one patterning process. The technical scheme of the invention can prevent the organic photosensitive material from remaining on the anode and improve the yield of the OLED display substrate.

Description

technical field [0001] The invention relates to the field of display technology, in particular to an OLED display substrate, a manufacturing method thereof, and a display device. Background technique [0002] With the continuous advancement of science and technology, visual information plays an increasingly important role in people's lives, so flat panel display devices that carry visual information also play an increasingly important role in people's lives. As a new generation of displays, OLED (Organic Light-Emitting Diode, Organic Light-Emitting Diode) displays have many advantages such as low power consumption and high contrast, and thus have attracted more and more attention from manufacturers. [0003] In the manufacturing process of the existing OLED display substrate, the anode of the display substrate is formed first, and then the pattern of the pixel defining layer is formed on the substrate formed with the anode. The pattern of the pixel defining layer has a plura...

Claims

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Application Information

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IPC IPC(8): H01L51/52H01L27/32H01L21/77
CPCH10K59/122H10K59/1201H10K71/00H10K59/1213H10K71/233G03F7/32G03F7/16G03F7/20G02F1/13394
Inventor 刘文渠张锋吕志军党宁董立文张世政
Owner BOE TECH GRP CO LTD