Etching solution composition for silver-containing layer and a display substrate using the same

A technology for display substrates and compositions, applied in the direction of surface etching compositions, optics, instruments, etc., can solve the problems of poor wiring side profile, difficulty in fine etching, increased silver re-adsorption, etc., to maintain etching uniformity, excellent Etching uniformity, anti-resorption effect

Inactive Publication Date: 2017-12-01
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] When a thin film containing silver (Ag) is vapor-deposited on a substrate, if a conventional etchant is used for patterning and etching, the following problems may arise: re-adsorption due to poor etching or slow etching speed. Process time becomes longer and fine etching is difficult
In particular, in the case of conventional compositions containing pota

Method used

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  • Etching solution composition for silver-containing layer and a display substrate using the same

Examples

Experimental program
Comparison scheme
Effect test

Example Embodiment

[0073] Performance test of etching solution composition

[0074] Indium oxide film / silver film / indium oxide film are sequentially coated on the substrate to form a three-layer film, and a photoresist having a predetermined pattern is formed on the substrate through a photolithography process to prepare a test piece. After that, the indium oxide film / silver film / indium oxide film was subjected to an etching process using the compositions of Examples 1 to 8 and Comparative Examples 1 to 12, respectively.

[0075] Put the etching liquid compositions of the above-mentioned Examples 1 to 8 and Comparative Examples 1 to 12 into the experimental equipment of the spray etching method (model name: ETCHER (TFT), KCTech), and set the temperature to 40°C While heating. After that, when the temperature reaches 40±0.1°C, the etching step of the test piece described above is performed. The total etching time is performed in accordance with the process time implemented on the actual production ...

Example Embodiment

[0076] Experimental example 1. Measurement of side etching distance of etching solution composition

[0077] After that, the substrate is put in to start spraying, and the etched substrate is taken out, washed with deionized water and dried. The dried substrate was cut, and the cross section was confirmed with a scanning electron microscope (SEM, model name: SU-8010, manufactured by Hitachi).

[0078] As a standard for measuring the side etch distance, the width from the edge of the photoresist to the inside of the metal due to etching was measured, and the results are shown in Table 2 below.

[0079]

[0080] ◎: Very good (side erosion≤0.1μm)

[0081] ○: Excellent (0.1μm

[0082] △: Good (0.2μm

[0083] Ⅹ: Bad (side erosion> 0.3μm)

Example Embodiment

[0084] Experimental example 2. Silver resorption measurement

[0085] After that, put the substrate in and start spraying. When the etching time reaches 100 seconds, the substrate is taken out and washed with deionized water. After that, it was dried by a hot air drying device, and the photoresist was removed by a photoresist stripper (PR stripper). After washing and drying, using a scanning electron microscope (SEM, model name: SU-8010, manufactured by Hitachi), after the etching is completed, the part where dissimilar metals such as data wiring are exposed or where friction may occur due to bending phenomenon The phenomenon that etched silver (Ag) is adsorbed on the site is analyzed by observing the entire surface. by figure 1 Evaluation was performed with the following criteria, and the results are shown in Table 2 below.

[0086]

[0087] ◎: Very good (less than 50)

[0088] ○: Excellent (less than 80)

[0089] △: Good (100 or less)

[0090] Ⅹ: Bad (more than 100)

[0091] [Tabl...

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Abstract

The invention relates to the etchant composition and display substrate using the same of the argentiferous thin film, more specifically, the phosphoric acid 45 about the total weight of composition, through 55 weight%, the nitric acid 2 through 9 weight%, the acetic acid 5 through 15 weight%, and the potassium nitrate 1 through 5 weight%, the etchant composition of the argentiferous thin film including the residual water, and the display substrate using the same.

Description

technical field [0001] The present invention relates to an etchant composition containing a silver thin film and a display substrate using the same. More specifically, it relates to a composition containing 45 to 55% by weight of phosphoric acid, 2 to 9% by weight of nitric acid, and 5 to 15% by weight of acetic acid relative to the total weight of the composition. % by weight, 1 to 5% by weight of potassium nitrate and the balance of water, an etchant composition containing silver thin film and a display substrate using the same. Background technique [0002] With the official entry into the information age, the field of displays that process and display a large amount of information has grown rapidly. In line with this trend, a variety of flat panel displays have been developed and are receiving special attention. [0003] Examples of such flat panel display devices include liquid crystal display devices (Liquid Crystal Display device: LCD), plasma display devices (Plasma ...

Claims

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Application Information

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IPC IPC(8): C23F1/30
CPCC23F1/30C09K13/04G02F1/1343H10K59/12H10K71/621
Inventor 沈庆辅安基熏李承洙张晌勋
Owner DONGWOO FINE CHEM CO LTD
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