Composite dielectric production process of electronic aluminum foil
An electronic aluminum foil and composite medium technology, applied in the field of energy storage technology, can solve the problems of increasing processing costs, increasing the operating burden of enterprises, and environmental pollution risks.
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Embodiment 1
[0031] (1) Vacuum coating: A high dielectric constant material is sprayed on the surface of the electronic aluminum foil with a low pressure of 90 μm by molecular beam coating to form a stable film layer. The specific operation steps are: the high dielectric constant material is deposited by molecular beam epitaxy device, at 5.0 x 10 ﹣4 Under the conditions of MPa ultra-vacuum and temperature 200-400°C, the high dielectric constant material is shot to the surface of the electronic aluminum foil in the form of beam molecular flow to form a composite dielectric layer of 100nm-3μm;
[0032] (2) Electrochemical treatment: the vacuum-coated electronic aluminum foil forms a layer of defects that may exist in the stable film layer with Al and Al through electrochemical methods. 2 o 3 Closely bonded composite dielectric layer, thereby increasing the relative permittivity ε r , the specific operation steps are: place the vacuum-coated electronic aluminum foil in a 3-10% aqueous solut...
Embodiment 2
[0035] (1) Vacuum coating: A high dielectric constant material is sprayed on the surface of the electronic aluminum foil with a low pressure of 90 μm by magnetron coating to form a stable film layer. The specific operation steps are: put the high dielectric constant material at 1000-1500 Molded and sintered into blocks under the temperature condition of ℃, at 5.0×10 ﹣4 Under MPa ultra-vacuum and 100-300°C temperature conditions, high-dielectric constant materials are deposited on the surface of electronic aluminum foil by high-frequency sputtering to form a composite dielectric layer of 100nm-2μm;
[0036] (2) Electrochemical treatment: the vacuum-coated electronic aluminum foil forms a layer of defects that may exist in the stable film layer with Al and Al through electrochemical methods. 2 o 3 Closely bonded composite dielectric layer, thereby increasing the relative permittivity ε r , the specific operation steps are: place the vacuum-coated electronic aluminum foil in a ...
Embodiment 3
[0039] (1) Vacuum coating: A high dielectric constant material is sprayed on the surface of the electronic aluminum foil with a medium pressure of 105 μm by molecular beam coating to form a stable film layer. The specific operation steps are: pass the high dielectric constant material through the molecular beam epitaxial device, at 5.0 x 10 ﹣4 Under the conditions of MPa ultra-vacuum and temperature 200-400°C, the high dielectric constant material is shot to the surface of the electronic aluminum foil in the form of beam molecular flow to form a composite dielectric layer of 100nm-3μm;
[0040] (2) Electrochemical treatment: the vacuum-coated electronic aluminum foil forms a layer of defects that may exist in the stable film layer with Al and Al through electrochemical methods. 2 o 3 Closely bonded composite dielectric layer, thereby increasing the relative permittivity ε r , the specific operation steps are: place the vacuum-coated electronic aluminum foil in a 3-10% aqueou...
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