A kind of preparation method of crsibcn nanocomposite thin film

A nano-composite and thin-film technology, applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problems that CrN thin film is not suitable for application, and achieve the effect of improving hardness and reducing dry friction coefficient

Active Publication Date: 2020-02-21
NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, after a lot of research, it has been found that CrN films deposited by different preparation methods have medium hardness (10 GPa) and high friction coefficient (about 0.5) under dry friction conditions, which makes CrN films unsuitable for application in the wear rate of surface materials. and special working conditions with strict friction coefficient

Method used

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  • A kind of preparation method of crsibcn nanocomposite thin film
  • A kind of preparation method of crsibcn nanocomposite thin film
  • A kind of preparation method of crsibcn nanocomposite thin film

Examples

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Effect test

Embodiment 1

[0021] (1) Substrate cleaning: 316L stainless steel (Φ30×6 mm) whose roughness is polished to 50 nm 2 ) Carry out ultrasonic cleaning in acetone, alcohol and deionized water for 10 minutes each, blow dry with a hair dryer and clamp on the stage of the physical vapor deposition system, 17 cm away from the target; when the background vacuum of the physical vapor deposition system Degree reaches 3.0×10 -6 At Torr, add 50sccm of Ar gas, set the bias voltage of the stainless steel substrate to -450V, and use the Ar generated by the ion beam source + Ions accelerated the bombardment of the 316L stainless steel surface for 30 minutes to remove contaminants on the substrate surface and activate the deposition surface;

[0022] (2) Preparation of transition layer: Ar + After the substrate is cleaned by ion bombardment, maintain the Ar gas flow rate at 50 sccm, adjust the bias voltage of the stainless steel substrate to -80V, and load the metal Cr target with a power of 1200 W through a dire...

Embodiment 2

[0025] (1) Substrate cleaning: 316L stainless steel (Φ30×6 mm) whose roughness is polished to 50 nm 2 ) Carry out ultrasonic cleaning in acetone, alcohol and deionized water for 10 minutes each, blow dry with a hair dryer and clamp on the stage of the physical vapor deposition system, 17 cm away from the target; when the background vacuum of the physical vapor deposition system Degree reaches 3.0×10 -6 At Torr, add 50sccm of Ar gas, set the stainless steel substrate bias voltage -450V, and use the Ar generated by the ion beam source + Ions accelerated the bombardment of the 316L stainless steel surface for 30 minutes to remove contaminants on the substrate surface and activate the deposition surface;

[0026] (2) Preparation of transition layer: Ar + After the substrate is cleaned by ion bombardment, maintain the Ar gas flow rate at 50 sccm, adjust the bias voltage of the stainless steel substrate to -80V, and load the metal Cr target with a power of 1200 W through a direct current...

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Abstract

The invention provides a preparation method of a CrSiBCN nanocomposite film, belongs to the field of film tribology and surface engineering, and can improve the hardness of a CrN film and reduce the dry friction coefficient of the CrN film. The preparation method comprises three steps of cleaning of a stainless steel substrate, preparation of a transition layer and preparation of a nanocomposite film; and a unbalance magnetron sputtering technology is used for co-sputtering of direct-current (DC) and radio-frequency (RF) magnetron targets in Ar, N2 or mixed atmosphere containing Si and C element gas to prepare the CrSiBCN nanocomposite film on the stainless steel substrate. In the preparation method of the CrSiBCN nanocomposite film, the Si and C elements can be from the reaction atmosphere or the sputtered targets; and the preparation method is high in operability, and is suitable for unbalance magnetron sputtering systems with different target positions and gas way configuration numbers.

Description

Technical field [0001] The invention belongs to the field of film tribology and surface engineering, and particularly relates to a method for preparing a CrSiBCN nano composite film. Background technique [0002] Chromium Nitride (CrN) is the first representative surface protective coating. Because of its good mechanical properties and chemical inertness, it has a place in the application of surface wear resistance or corrosion protection. However, after a lot of research, it has been found that CrN films deposited by different preparation methods have medium hardness (10 GPa) and a high friction coefficient (about 0.5) under dry friction conditions. This makes CrN films unsuitable for use in the wear rate of surface materials. And in special conditions with demanding friction coefficients. In order to improve the hardness of the CrN film and reduce its dry friction coefficient, the CrN nanocomposite structure is constructed and the lubricating component is added. Through the d...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23C14/06C23C14/35C23C14/02
CPCC23C14/0057C23C14/025C23C14/0664C23C14/352
Inventor 王谦之周飞孔继周
Owner NANJING UNIV OF AERONAUTICS & ASTRONAUTICS
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