A process-free heat-sensitive plate for on-machine development with a nano-micron structure protective layer

A protective layer, nano-micron technology, applied in the photo-engraving process of the pattern surface, photosensitive materials for opto-mechanical equipment, printing plates, etc. Problems such as poor permeability, to achieve the effect of high print resistance and high wear resistance

Active Publication Date: 2020-10-27
LUCKY HUAGUANG GRAPHICS +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0017] The purpose of the present invention is to solve the unresolved problem of CN104730862A: "Negative Photosensitive Composition and Thermal Plate Made from the Composition", that is, the film-forming wettability of the water-soluble protective layer. The present invention adopts a hydrophilic but water-insoluble The protective layer with a nano-micron structure solves the problems of the protective layer polluting the dampening solution and the poor permeability of the film at room temperature, improves the on-machine developing ability of the plate, greatly reduces the number of passing paper, and the plate can be directly printed on the machine and can be Obtain high printing strength and realize green environmental protection printing

Method used

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  • A process-free heat-sensitive plate for on-machine development with a nano-micron structure protective layer
  • A process-free heat-sensitive plate for on-machine development with a nano-micron structure protective layer
  • A process-free heat-sensitive plate for on-machine development with a nano-micron structure protective layer

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0096] Synthesis Example 1 (Emulsion Particle P1)

[0097] Add 300g isopropanol, 100g deionized water, 10g (10% by weight) example compound A1 (n is 60) to a 1000ml four-necked flask with temperature-controlled heating, mechanical stirring, condensation reflux and nitrogen protection device, heat and stir evenly , 70g (70% by weight) St (styrene), 10g (10% by weight) AN (acrylonitrile), 10g (10% by weight) HEMA hydroxyethyl methacrylate and 0.7g AIBN (azo bisisobutyronitrile), the dropwise addition time was 1 hour, and 0.3 g of AIBN (azobisisobutyronitrile) was added after the reaction for 7.5 hours, and the reaction was continued for another 12 hours.

[0098] The solid content was 25%, the GPC molecular weight was 93600, and the particle diameter was 200 nm.

Synthetic example 2

[0099] Synthesis Example 2 (Emulsion Particle P2)

[0100] Add 357g isopropanol, 119g deionized water, 10g (10% by weight) example compound A2 (n is 50) to a 1000ml four-necked flask with temperature-controlled heating, mechanical stirring, condensation reflux and nitrogen protection device, heat and stir evenly , 60g (60% by weight) St (styrene), 20g (20% by weight) AN (acrylonitrile), 10g (10% by weight) HEMA hydroxyethyl methacrylate and 0.7g AIBN (azo Diisobutyronitrile), the dropwise addition time was 1.5 hours, and 0.3 g of AIBN (azobisisobutyronitrile) was added after the reaction for 7.5 hours, and the reaction was continued for another 12 hours.

[0101] The solids content (solute / solvent) was 21%, the GPC molecular weight was 76800, and the particle diameter was 150 nm.

Synthetic example 3

[0102] Synthesis Example 3 (Emulsion Particle P3)

[0103] Add 417g isopropanol, 139g deionized water, 10g (10% by weight) example compound A1 (n is 40) to a 1000ml four-necked flask with temperature-controlled heating, mechanical stirring, condensation reflux and nitrogen protection device, heat and stir evenly , 50g (50% by weight) St (styrene), 30g (30% by weight) AN (acrylonitrile), 10g (10% by weight) HEA hydroxyethyl acrylate and 0.7g AIBN (azodiisopropyl acrylate) were added dropwise at 60°C Butyronitrile), the dropwise addition time was 2.0 hours, and 0.3 g of AIBN (azobisisobutyronitrile) was added after the reaction for 7.5 hours, and the reaction was continued for another 12 hours.

[0104] The solids content was 18%, the GPC molecular weight was 63700, and the particle diameter was 100 nm.

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Abstract

The invention relates to an on-press developing treatment-free thermal-sensitive plate with a nano-micron-structure protective layer. The on-press developing treatment-free thermal-sensitive plate comprises an aluminum plate base support, a coating layer containing a negative image light-sensitive composition and the protective layer with a nano-micron structure, all of which are distributed frombottom to top. The aluminum plate base support is subjected to electrolytic roughening, anodic oxidation and hole sealing treatment, wherein the average roughness of center lines ranges from 0.4 micron to 0.6 micron; the negative image light-sensitive composition mainly contains discrete nano-micron particles, diurethone prepolymer, multi-functional-group monomers, a thermal polymerization initiator and an infrared absorbent; and the diameter of the discrete nano-micron particles in the protective layer with the nano-micron structure ranges from 50 nm to 150 nm. The protective layer which is hydrophilic but insoluble in water and has the nano-micron structure is adopted, the problems that a fountain solution is contaminated by the protective layer, and the normal-temperature permeability of a formed film is poor are solved, the plate on-press developing capacity is improved, the number of plate passing paper is greatly reduced, plates can be directly subjected to on-press printing, high durability is achieved, and environment-friendly printing is achieved.

Description

technical field [0001] The invention belongs to the technical field of lithography, and in particular relates to an on-machine development and treatment-free thermal plate with a nano-micron structure protective layer. Background technique [0002] Lithographic printing technology has changed from the traditional laser phototypesetting film copying PS plate technology to computer-to-plate technology (CTP technology for short), and CTP plates are also gradually popularized. There are many types of CTP plates, the more popular ones include silver salt diffusion CTP plates, UV-CTP plates, violet laser polymerization CTP plates, thermal CTP plates, etc. Among them, the most widely used is the thermal CTP plate. [0003] CTP plate making technology requires a "development process", and there are environmental problems caused by waste liquid treatment. At present, the development of a new generation of green, environmentally friendly chemical-free CTP plates is a hot spot in the...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B41N1/08B41N1/10B41N1/20G03F7/004G03F7/027
CPCB41N1/083B41N1/10B41N1/20B41N2207/02B41N2207/14G03F7/004G03F7/027
Inventor 宋小伟张涛高英新高峰马天如刘松玲张攀李喜乐
Owner LUCKY HUAGUANG GRAPHICS
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