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Resist stripping liquid composition

A stripping solution and composition technology, applied in the preparation of detergent compositions, non-surface-active detergent compositions, detergent mixture compositions, etc., can solve the problem that the removability of color resists and organic insulating films cannot be fully ensured and other problems to achieve the effect of improving the resist removal power

Pending Publication Date: 2018-07-31
DONGWOO FINE CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0017] However, the above-mentioned conventional documents have a problem that the removability of the color resist and the organic insulating film cannot be sufficiently ensured.

Method used

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  • Resist stripping liquid composition
  • Resist stripping liquid composition
  • Resist stripping liquid composition

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1～12 and comparative example 1～8

[0071] The resist stripping liquid composition of Examples 1-12 and Comparative Examples 1-8 containing the component of following Table 1 and Table 2 was manufactured.

[0072] [Table 1]

[0073]

[0074]

experiment example

[0075] Experimental example: Resist removal evaluation

[0076] In the evaluation of resist removal, a color filter substrate coated with a transparent material forming a column spacer (CS) and red, green, and blue (hereinafter referred to as WRGB) on each pixel (pixel) was used. The color resist was manufactured by pre-baking at 90° C. for 120 seconds after coating, developing after exposure, and then hard-baking the substrate patterned in the oven in an oven at 220° C.

[0077] On the upper part of the color filter substrate on which the color resist pattern is formed, an overcoat layer for eliminating the level difference between materials is coated. The organic film layer can be formed by photocuring, but is not limited thereto.

[0078] In order to confirm the removability of the organic film on the upper part of the color filter pattern substrate and the color resist including transparent materials, after immersing in a solution at 75°C for 5 minutes, 10 minutes, and 1...

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Abstract

The invention relates to a resist stripping liquid compostition, and more specifically, to a resist stripping liquid compostition which comprises, by weight, 1~15% of quaternary ammonium salt compound, 20~60% of nonprotonic polar organic solvent, 0.01~1% of inorganic base or its salt compound, 1~20% of compound indicated as the following chemical formula 1, and the balance of water. In the chemical formula 1, one of R1 to R3 is an alkylamine having 1 to 3 carbon atoms, and in this case, the remainder of R1 to R3 is hydrogen.

Description

technical field [0001] The present invention relates to a resist stripping liquid composition. Background technique [0002] In recent years, with the miniaturization of electronic equipment, the high integration and multilayering of semiconductor elements are rapidly progressing, so it is necessary to stably form 0.5 μm photoresist (photoresist, PR) pattern miniaturization The following microcircuit technology. [0003] A microcircuit of a semiconductor device or a liquid crystal display device is realized by a photolithography process. The photolithography process is carried out as follows: On the conductive metal film such as aluminum, aluminum alloy, copper, copper alloy, molybdenum, molybdenum alloy or insulating film such as silicon oxide film and silicon nitride film formed on the substrate, uniformly Apply a photoresist, and selectively expose and develop it to form a photoresist pattern, and then use the patterned photoresist film as a mask to form the above-menti...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/42
CPCG03F7/425G03F7/42G03F7/004C11D7/3281C11D7/3209C11D7/5004C11D7/12C11D7/14C11D2111/22
Inventor 房淳洪金佑逸洪宪杓
Owner DONGWOO FINE CHEM CO LTD