Method for preparing anti-reflection coating film with nano porous structure on surface of flexible base material
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- 浙江理工大学上虞工业技术研究院有限公司
- Publication Date
- 2018-09-11
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Abstract
Description
technical field
[0001] The invention relates to the technical field of anti-reflection coatings, in particular to a method for preparing nano-porous structure anti-reflection coatings on the surface of a flexible substrate. Background technique
[0002] Anti-reflection coatings can effectively reduce the reflectivity of substrates to incident light and improve light utilization efficiency, so they have broad application prospects in the fields of energy, optical imaging, and military invisibility. Because the anti-reflection coating film prepared now has obvious selectivity to light waves in the visible wavelength range, the wavelength corresponding to the maximum transmittance of the anti-reflection coating film (λ max ) in the large wavelength range of visible light (700-800nm), the transmittance loss of the coating film in the small wavelength range (400-450nm) is very serious. For example, the λ of the antireflection coating in the document "Hierarchical Nanoporous Sili...