Method for preparing anti-reflection coating film with nano porous structure on surface of flexible base material

A flexible substrate and nano-porous technology, applied in coatings and other directions, can solve the problems of low anti-reflection efficiency and inability to realize nano-porous structure, and achieve the effects of wide application range, integrity and enhanced binding force
CN108517045AActive Publication Date: 2018-09-11浙江理工大学上虞工业技术研究院有限公司

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
浙江理工大学上虞工业技术研究院有限公司
Publication Date
2018-09-11

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Abstract

The invention discloses a method for preparing an anti-reflection coating film with a nano porous structure on the surface of a flexible base material. The method comprises the following steps: 1) after mixing emulsion of hard particles and emulsion of soft particles, adding (NH4)2CO3 or NH4HCO3 to obtain a film coating solution; 2) coating the flexible base material with the film coating solutionby adopting a spin-coating method; after drying in an air-blowing drying oven, finishing preparation. The nano porous coating film can realize the foundation of a low refractive index level, the thickness of the coating film is regulated and controlled and the wavelength of maximum transmittance is changed, so that an applicable range is wider; when lambda max of the coating film is large wavelength, the transmittance loss of the coating film on small wavelength is only 0.45 percent; the soft particles form the film so that on one hand, the hard particles can be stuck together and the integrity of a coating film structure is improved; on the other hand, the binding force between the coating film and the base material also can be enhanced; when the base material is deformed, optical properties of the base material are stable.
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Description

technical field

[0001] The invention relates to the technical field of anti-reflection coatings, in particular to a method for preparing nano-porous structure anti-reflection coatings on the surface of a flexible substrate. Background technique

[0002] Anti-reflection coatings can effectively reduce the reflectivity of substrates to incident light and improve light utilization efficiency, so they have broad application prospects in the fields of energy, optical imaging, and military invisibility. Because the anti-reflection coating film prepared now has obvious selectivity to light waves in the visible wavelength range, the wavelength corresponding to the maximum transmittance of the anti-reflection coating film (λ max ) in the large wavelength range of visible light (700-800nm), the transmittance loss of the coating film in the small wavelength range (400-450nm) is very serious. For example, the λ of the antireflection coating in the document "Hierarchical Nanoporous Sili...

Claims

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