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Heterotopic multi-metal oxide film epitaxial growth and continuous preparation method

A technology of oxide film and multi-element metal, which is applied in metal material coating process, ion implantation plating, coating, etc., can solve the problems of uneven component structure, easy deterioration of structure, holes, etc., and achieve rapid long-range preparation of high High-quality epitaxial film, crystallization and epitaxial growth, fast growth effect

Inactive Publication Date: 2018-09-28
SHANGHAI UNIV
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In order to solve the problems of the prior art, the purpose of the present invention is to overcome the deficiencies of the prior art, and provide a method for the epitaxial growth and continuous preparation of heterogeneous multi-element metal oxide thin films, mainly to solve the ubiquitous uneven component structure , serious element diffusion, large surface roughness, holes, and secondary equal defects can realize the co-evaporation of multiple metal elements with different melting points and sublimation temperatures. The evaporation technology and conditions of the element can be selected according to the characteristics of the constituent elements, and the dynamic baseband can be realized. The uniformity of the precursor components, the post-oxidation treatment starts from the highly refined, nano-scale precursor components, and there are many nucleation centers in the later stage of crystallization growth, the growth is fast and the density is relatively high. In addition, by controlling the oxygen partial pressure, it can be realized Reactive heat treatment at a lower temperature can achieve crystallization and epitaxial growth at a lower temperature, especially to overcome technical problems such as easy deterioration of the structure after multi-layer coating and decrease in crystal orientation

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  • Heterotopic multi-metal oxide film epitaxial growth and continuous preparation method

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Embodiment 1

[0037] In this example, see figure 1 , an ectopic co-evaporation instrument, the names of each part are as follows: unwinding wheel 1, bidirectional multi-strand tape transport system 2, low oxygen pressure chamber 3, high oxygen pressure chamber 4, rewinding wheel 5, electron beam evaporation 6, thermal Evaporation 7, electron beam evaporation 8, taking the second-generation high-temperature superconducting tape as an example and combining figure 1 , which describes in detail the method of ex-situ continuous preparation of multi-element metal oxide epitaxial thin films. This process is always kept at 10 -5 under Torr vacuum conditions.

[0038] In this example, see figure 1 , a method for the epitaxial growth of heterotopic multi-element metal oxide film and its continuous preparation, comprising the steps of:

[0039] Step 001. Start the main power supply, start the compressor, start the water cooler, start the computer, open the backfill valve to backfill nitrogen and o...

Embodiment 2

[0052] This embodiment is basically the same as Embodiment 1, especially in that:

[0053] In this embodiment, a method for the epitaxial growth of heterotopic multi-element metal oxide film and its continuous preparation includes the following steps:

[0054] Step 001. This step is the same as Embodiment 1;

[0055] Step 002. This step is the same as Embodiment 1;

[0056] Step 003. This step is the same as Embodiment 1;

[0057] Step 004. At the same time as vapor deposition, turn on the superconducting base tape conveying system, adjust the tension of the tape, the distance of the tape and the speed of the tape, and adopt the two-way multi-strand control of the strip to operate the multi-element metal on the multi-strand superconducting base tape. Co-dynamic deposition to prepare superconducting strip precursor film on superconducting substrate;

[0058] Step 005. This step is the same as Embodiment 1;

[0059] Step 006. This step is the same as Embodiment 1;

[0060] ...

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Abstract

The invention provides a heterotopic multi-metal oxide film epitaxial growth and continuous preparation method. According to the characteristics of a metal target, the initial component evaporation isperformed; after nanoparticles evaporated from the target the high vacuum state reach the substrate, the nanoparticles are deposited into an amorphous metal precursor film; after deposition, the precursor film is transported to low-pressure atmospheres with different oxygen partial pressures; and at different temperatures, crystallization and epitaxial growth are performed. By the method, co-evaporation of multi-metal elements with different melting points and sublimation temperatures is realized, the evaporation technology and conditions of the elements can be selected according to characteristics of the constituent elements, and the dynamic baseband can help realize the uniformity of the precursor component; the later oxidation treatment starts with the highly-refined nano-scale precursor, nucleation centers of later crystallization growth are many, and growth is fast and density is high; and by controlling the oxygen partial pressure, the reaction heat-treatment can be realized ata lower temperature, and then crystallization and epitaxial growth can be achieved at low temperature. The preparation method is simple.

Description

technical field [0001] The invention relates to a method for preparing superconducting materials, in particular to a method for continuously preparing superconducting strips, which is applied in the technical field of preparing high-temperature superconducting materials. Background technique [0002] Multi-element metal oxide films, including high-temperature superconducting (REBaCuO, RE=RE=Y, Gd, Dy and other rare earth elements), huge giant magnetoresistance (LaSrMnO), piezoelectric ceramics (PZT), ferroelectric materials, etc., have many functions and wide application. For example with ReBa based 1 Cu 2 o 7-δ (REBaCuO,) the second-generation high-temperature superconducting tape of high-temperature superconductors. The structure of this new type of power material includes a metal base tape, an oxide buffer layer, a copper-based oxide, a REBaCuO superconducting layer, and a metal protection layer. The second-generation high-temperature superconducting tape refers to a ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24C23C14/58C23C14/16
CPCC23C14/24C23C14/16C23C14/5853
Inventor 蔡传兵曲兰雪鲁玉明白传易郭艳群刘志勇
Owner SHANGHAI UNIV
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