Preparation method of after-sun repair mask containing Huang Xiang neem extract

Abstract

The invention provides a preparation method of an after-sun repair mask containing Huang Xiang neem extract, and belongs to the technical field of mask preparation. The preparation method comprises steps as follows: preparation of the Huang Xiang neem extract, proportioning of raw materials in parts by weight, preparation of an aqueous phase liquid, emulsification, cooling and the like. Huang Xiang neem has excellent sun-screening effect and can be used for after-sun repair of damaged skin; radix glycyrrhizae and chamomile have effects of clearing away heat and toxic materials, resisting bacteria and inflammation and pacifying and calming skin, are suitable for various kinds of skin, especially sensitive skin and can be applied to after-sun repair of damaged skin. With adoption of nano supercritical propolis, permeation and absorption are quite easy, the problem about compatibility with other components is solved successfully, the nano supercritical propolis has functions of strongly resisting oxidation and inhibiting tyrosinase activity, and the whitening and freckle-removing effects are remarkable.

Description

technical field [0001] The invention relates to the technical field of facial mask preparation, in particular to a preparation method of an after-sun repairing facial mask containing neem extract. Background technique [0002] Mask is an important step in skin care. Effective ingredients such as moisturizing, whitening, and anti-aging in the mask can be better absorbed by the skin. However, many facial masks that appear on the market today contain a large amount of chemical compounds. Long-term use will have certain side effects on the skin, making the nutrients in the facial mask difficult to be absorbed, and even cause adverse reactions such as skin inflammation. It caused immeasurable losses. When making many facial masks on the market, there are big problems in the selection and dosage of chemical substances. There are few natural ingredients, and the skin care effect is not good. Further improvement is needed, and the functional effect needs to be improved. Contents o...

AI Technical Summary

Problems solved by technology

However, many facial masks that appear on the market today contain a large amount of chemical compounds. Long-term use will have certain side effects on the skin, making the nutrients in the facial mask difficult to be absorbed, and even cause adverse reactions such as skin inflammation. Caused immeasurable losses. When making many masks on the market, there are big problems in the selection and dosage of chemical substances. There are few natural ingredients, and the skin care effect is not good. Further improvement is needed, and the functional effect needs to be improved.