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Laminated film

A film and oxide layer technology, applied in the field of laminated films, can solve the problems of chemical resistance, acid resistance and insufficient alkali resistance of transparent oxide films, and achieve excellent chemical resistance, excellent moisture permeability and gas barrier. sexual effect

Inactive Publication Date: 2018-10-19
NITTO DENKO CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the chemical resistance (such as acid resistance and alkali resistance) of this transparent oxide film is very insufficient, and further, transparency is also required to be improved.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0071] A commercially available COP film (manufactured by Zeon Corporation, trade name "ZEONOR", thickness 40 μm) was used as a substrate, and a film containing Al, SiO 2 and a sputtering target of ZnO, a first oxide layer (30 nm in thickness) was formed on the substrate by DC magnetron sputtering. Next, using a Si target, a second oxide layer (50 nm) was formed on the first oxide layer of the substrate / first oxide layer laminate. In this way, a substrate / first oxide layer (AZO) / second oxide layer (SiO 2 ) The composition of the laminated film. The obtained laminated film was subjected to the evaluations of (2) to (6) above. The results are shown in Table 1.

Embodiment 2

[0073] A laminated thin film was produced in the same manner as in Example 1 except that the thickness of the second oxide layer was set to 60 nm. The obtained laminated film was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

Embodiment 3

[0075] A laminated thin film was produced in the same manner as in Example 1 except that the thickness of the second oxide layer was set to 80 nm. The obtained laminated film was subjected to the same evaluation as in Example 1. The results are shown in Table 1.

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Abstract

Provided is a laminated film that has an excellent moisture permeability and gas barrier properties, and has an excellent chemical resistance, transparency, flexibility, and heat resistance. A laminated film of the invention has, in the following order: a substrate; a first oxide layer containing ZnO, Al, and SiO2; and a second oxide layer formed from SiO2. In an embodiment of the invention, the thickness of the first oxide layer is 10nm-100nm, and the thickness of the second oxide layer is 10nm-100nm. In an embodiment of the invention, the laminated film has a moisture permeability not exceeding 3.0x10-2g / m2 / 24hr and a total visible light transmittance of at least 84%.

Description

technical field [0001] This invention relates to laminated films. More specifically, the present invention relates to a laminated film having two oxide layers on a substrate. Background technique [0002] Conventionally, barrier films have been used in image display devices (eg, liquid crystal display devices, organic electroluminescent (EL) display devices) and solar cells (eg, thin-film solar cells, thin-film solar cells). In the development of such a barrier film, the addition of SiO to the Al-Zn-O (aluminum-added zinc oxide) film has been proposed as a barrier film with a fast film forming speed, a low refractive index, and good gas barrier properties. 2 transparent oxide film (thin film) (Patent Document 1). However, the chemical resistance (for example, acid resistance and alkali resistance) of this transparent oxide film is very insufficient, and further, transparency is also required to be improved. [0003] prior art literature [0004] patent documents [0005...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B32B9/00B32B9/04C23C14/08H01L31/048H01L51/50H05B33/02H05B33/04
CPCB32B9/00C23C14/08H01L31/048H05B33/02H05B33/04Y02E10/50C23C14/10C23C14/35C23C28/04
Inventor 宫本幸大梨木智刚
Owner NITTO DENKO CORP