Etching solution formula of molybdenum grid product

A production method and etching solution technology are applied in the field of etching solution formulations for molybdenum gate products, which can solve the problems of easily changing concentration, unstable etching solution, and difficulty in controlling dosage, etc., and achieve the effect of stable physical and chemical properties.

Inactive Publication Date: 2018-11-06
景瓷精密零部件(桐乡)有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The etchant currently used in etching molybdenum gate products is not stable enough, and the concentration is easy to change, which makes it difficult to control the amount of etching, and will produce toxic gases that will cause harm to the staff

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0018] A kind of etchant formula of molybdenum gate product, comprises following components:

[0019] 100 liters of ionized water;

[0020] 50 liters of sulfuric acid with a concentration of 98%;

[0021] Sodium nitrate 10 kg;

[0022] Thiourea 15 grams.

[0023] The method for the production etchant of above-mentioned etchant formulation,

[0024] 1) Measure 100 liters of ion water and pour it into a 10mm thick plastic ion water tank;

[0025] 2) Add 50 liters of sulfuric acid to the ion water tank in batches, the sulfuric acid concentration is 98% and stir, and control the temperature within 65°;

[0026] 3) When the temperature is within 40°, add 10kg of sodium nitrate and 15g of thiourea and fully dissolve;

[0027] 4) Measure the Baume degree, and the Baume degree of the dissolved solution is 42 to obtain the etching solution.

Embodiment 2

[0029] A kind of etchant formula of molybdenum gate product, comprises following components:

[0030] 100 liters of ionized water;

[0031] 60 liters of sulfuric acid with a concentration of 98%;

[0032] Sodium nitrate 20 kg;

[0033] Thiourea 20 grams.

[0034] The specific processing and production method is with reference to embodiment one.

Embodiment 3

[0036] A kind of etchant formula of molybdenum gate product, comprises following components:

[0037] 100 liters of ionized water;

[0038] 53 liters of sulfuric acid with a concentration of 95%;

[0039] Sodium nitrate 13 kg;

[0040] Thiourea 15 grams.

[0041] The specific processing and production method is with reference to embodiment one.

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PUM

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Abstract

The invention discloses an etching solution formula of a molybdenum grid product. The etching solution formula comprises the following components of 100 liters of water, 50-60 liters of sulfuric acid,10-20 kg of sodium nitrate, and 15-20 g of thiourea, wherein the concentration of sulfuric acid is 92%-98%, and the water is ionic water. According to the method, the etching solution provided by theinvention is stable in self-physical and chemical properties, the situation that the concentration is changed due to volatilization and the like can be avoided even if the etching solution is placed,the use amount of the etching liquid can be accurately controlled according to the concentration of the etching liquid during etching, so that more safer is achieved.

Description

technical field [0001] The invention belongs to the field of etching molybdenum grid products, and more specifically relates to an etching liquid formula and a production method for molybdenum grid products. Background technique [0002] Molybdenum and molybdenum alloys not only have high temperature strength, good electrical conductivity, thermal conductivity and low thermal expansion coefficient, but also have the advantage of being easier to process than tungsten. Therefore, plates, strips, foils, tubes, rods, wires and profiles produced by conventional processing methods Such as electron tube (grid and anode), electric light source (support material) parts, metal processing tools (die casting and extrusion die, forging die, perforated plug, liquid metal filter screen) and turbine disk, spacecraft parts and other components been widely used in. [0003] Grid: A mesh or helical electrode composed of metal filaments. [0004] The etchant currently used in etching molybden...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/26
CPCC23F1/26
Inventor 刘飞豹刘浩雨
Owner 景瓷精密零部件(桐乡)有限公司
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