Preparation method and device for refractory rare metal annular target materials

A rare metal and preparation device technology, applied in metal material coating process, ion implantation plating, coating, etc., can solve problems such as cumbersome process routes, poor product compactness, and low product purity, and achieve simplified process routes and production Simple process and high product purity

Inactive Publication Date: 2018-11-13
QINGDAO BLUE LIGHT NEW MATERIAL CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

At present, the ring-shaped refractory rare metal target is mainly prepared by powder metallurgy. The process route of this method is cumbersome and the cost is high. Pure refractory rare metal powder, after multiple subsequent production processes, the product will be polluted many times during the production process, resulting in the purity of the final product being lower than that of the initial raw material

Method used

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  • Preparation method and device for refractory rare metal annular target materials
  • Preparation method and device for refractory rare metal annular target materials

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Experimental program
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Effect test

Embodiment 1

[0034] Such as figure 1 As shown, the preparation device of the refractory rare metal annular target according to the present invention includes a furnace body 5, a vacuum system, an air filling valve 12, an electron gun 4 and a water-cooled mold, and the furnace body is divided into a furnace chamber and an electron gun chamber, The vacuum system is respectively connected with the furnace chamber and the electron gun chamber, and the gas charging valve is respectively connected with the furnace chamber and the electron gun chamber. The water-cooled mold is arranged on the support seat 10 inside the furnace chamber, and the electron gun is arranged above the water-cooled mould. The water-cooled mold 9 is The mold that is provided with several annular water-cooling grooves 8. Such as figure 2 As shown, several annular water-cooling grooves are evenly distributed on the water-cooling mold. The depth of the annular water cooling groove is 30mm.

[0035] The vacuum system incl...

Embodiment 2

[0037] The preparation method of the refractory rare metal annular target according to the present invention comprises the following steps:

[0038] A. Loading: 500g of refractory rare metal raw materials 13 with an impurity element content of 0.5% are sequentially loaded into the water-cooling tank of the water-cooling mold;

[0039] B. Vacuuming: Close the furnace body, pass in cooling circulating water, open the vacuum system, and carry out vacuuming treatment: start the mechanical pump of the vacuum system in the furnace chamber, and after the furnace chamber is vacuumed to below 1000Pa, start the Roots pump to turn the furnace After the chamber is vacuumed below 10Pa, start the diffusion pump to vacuum the furnace chamber below 0.05Pa; start the mechanical pump of the electron gun vacuum system to pump the vacuum of the electron gun chamber below 1000Pa, start the Roots pump to vacuum the electron gun chamber After reaching below 10Pa, start the molecular pump to evacuate...

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Abstract

The invention relates to a preparation method and device for refractory rare metal annular target materials, and belongs to the technical field of metal target material preparation. The device comprises a furnace body, a vacuum system, an inflation valve, an electronic gun and a water cooling mould. The furnace body is divided into a furnace room and an electronic gun room. The vacuum system is connected with the furnace room and the electronic gun room. The inflation valve is connected with the furnace room and the electronic gun room. The water cooling mould is arranged in the furnace room.An electronic gun is arranged above the water cooling mould. The water cooling mould is a mold provided with multiple annular water cooling grooves. By means of the technical scheme, the preparation process of the refractory rare metal target materials can be simplified, the subsequent processing difficulty can be lowered, and the production efficiency and purity of products can be improved.

Description

technical field [0001] The invention relates to a preparation method and device for a refractory rare metal annular target, belonging to the technical field of metal target preparation. Background technique [0002] In this technical field, refractory rare metals refer to rare metals with a melting point higher than 1650°C, including one or more of niobium, tantalum, titanium, and molybdenum. At present, the ring-shaped refractory rare metal target is mainly prepared by powder metallurgy. The process route of this method is cumbersome and the cost is high. Pure refractory rare metal powder, through the subsequent multi-channel production process, will cause multiple pollutions to the product during the production process, resulting in the purity of the final product being lower than that of the initial raw material. Contents of the invention [0003] In view of the above-mentioned defects in the prior art, the present invention proposes a new method and device for prepari...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C22B9/22
CPCC23C14/3414C22B9/228
Inventor 郭校亮张磊陈良杰张建帅
Owner QINGDAO BLUE LIGHT NEW MATERIAL CO LTD
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