Method for conducting amorphous TiO2 pulsed chemical vapor phase deposition on TiO2 particle surfaces

A technology of chemical vapor deposition and particle surface, which is applied in the direction of gaseous chemical plating, metal material coating process, coating, etc., can solve the problems of titanium dioxide pigment optical performance and cost increase, and achieve high decolorization power and operation Convenience and enhanced weather resistance

Active Publication Date: 2018-11-23
SICHUAN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the introduction of heterogeneous oxides will affect the optical properties of titanium dioxide pigments to a certain extent, and at the same time, the introduction of other raw materials in the industry will increase the cost

Method used

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  • Method for conducting amorphous TiO2 pulsed chemical vapor phase deposition on TiO2 particle surfaces
  • Method for conducting amorphous TiO2 pulsed chemical vapor phase deposition on TiO2 particle surfaces

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0019] a. Dry the anatase titanium dioxide at 120 °C for 90 minutes to remove the adsorbed water on the surface of the titanium dioxide.

[0020] b. Weigh 1.5g of dried titanium dioxide and disperse it in a petri dish, and place it in a vacuum desiccator.

[0021] c. Take a certain amount of TiCl with a sample bottle 4 , and placed in a vacuum desiccator, and evacuated to a vacuum degree of 0.095Mpa.

[0022] d. After standing for 60 min, part of the unreacted TiCl 4 Pump into the NaOH solution, then open the cover, let the water vapor in the air enter the reactor, and let it stand for 30 minutes, take out the titanium dioxide, and bake it in an oven at 105 °C for 120 minutes.

[0023] e. Repeat the above operations to increase amorphous TiO 2 Thickness of the film.

[0024] Take a small amount of the above-mentioned method obtained through 1 time ( figure 1 b), 2 times ( figure 1 c) and 3 times ( figure 1 d) coated titanium dioxide, and with uncoated titanium dioxide (...

Embodiment 2

[0027] a. Dry the titanium dioxide in a desiccator to remove the outer layer of adsorbed water on the surface of the titanium dioxide.

[0028] b. Take 1 Kg of dried titanium dioxide and place it in a titanium reactor with a volume of 15L (d=0.3 m, H=0.2 m).

[0029] c. Vacuum until the vacuum degree of the reactor is 0.095MPa, and then open the 4 connected to the valve so that the TiCl 4 Volatilize into the reactor, and place the whole reactor on the shaker for 100 min to shake TiCl 4 Full contact with titanium dioxide.

[0030] d. After the reaction, part of the unreacted TiCl 4 After the NaOH solution is pumped into the reactor, humid air containing relatively high water vapor is passed into the reactor to make the TiCl connected to the hydroxyl group 4 further hydrolysis.

[0031] e. Dry the coated titanium dioxide at 105°C, and repeat the above process to obtain amorphous TiO with different thicknesses 2 film.

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Abstract

The invention discloses a method for conducting amorphous TiO2 pulsed chemical vapor phase deposition on TiO2 particle surfaces. By covering titanium dioxide with inert materials of SiO2, Al2O3 and the like, the photocatalytic activity of titanium dioxide can be effectively inhibited, in current industrial application, normally, the surface of TiO2 is covered through a liquid phase deposition technology, however, according to a liquid phase covering method, the thickness and the evenness of thin film cannot be controlled precisely. A vapor phase atom titanium dioxide film covering method is provided before, wherein a layer of SiO2 thin film with the thickness of 3 nm is deposited on TiO2 particle surfaces; however, excessive SiO2 covering can cause decline of the lightening power of TiO2 due to the fact that a refractive index (1.46) of SiO2 is lower than that (2.55) of anatase TiO2. The invention provides a pulsed chemical vapor phase deposition method, wherein TiCl4 is used as a Ti precursor, at the normal temperature, TiCl4 is reacted with surface hydroxyl of TiO2 to form an amorphous TiO2 thin film with even thickness of 3 nm; the photocatalytic activity of titanium dioxide covered with the amorphous TiO2 is effectively inhibited, and compared with a sample covered with SiO2, the lightening power of the titanium dioxide covered with the amorphous TiO2 is obviously enhanced.

Description

technical field [0001] The invention relates to the field of chemical industry, in particular to a pulse chemical vapor phase deposition of amorphous TiO on the surface of pigment titanium dioxide particles 2 Methods. Background technique [0002] Due to its excellent physicochemical properties, TiO 2 White pigments are widely used in coatings, pharmaceuticals, plastics, cosmetics, synthetic fibers and papermaking. However TiO 2 The photocatalytic activity of the paint causes the degradation of organic molecules in the paint, especially when exposed to sunlight and ultraviolet light, resulting in discoloration and peeling of the paint. In order to suppress its photocatalytic activity, TiO 2 Pigments are usually coated with inert substances such as SiO 2 、Al 2 o 3 , ZrO 2 , NiO, CoO, CeO 2 , or SiO 2 -Al2O 3 . At present, TiO is usually processed by liquid phase deposition technology in industrial applications. 2 Surface coating, however, in these processes, the ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/40C23C16/455
CPCC23C16/405C23C16/4417C23C16/45523
Inventor 梁斌于洋洋
Owner SICHUAN UNIV
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