Method for producing a layer with perovskite material and device with a layer of this type

A technology for perovskite materials and equipment, applied in the field of layered equipment, electro-optical and/or optoelectronic equipment, can solve the problems of high cost, manufacturing cost, damage to the lattice structure of perovskite materials, etc., and achieve reduced deterioration and high-efficiency equipment. , the effect of long-term stability improvement

Inactive Publication Date: 2018-11-23
SIEMENS AG +1
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

In particular, perovskite materials currently do not have sufficient long-term stability under the influence of ambient air: for example, water molecules disrupt the lattice structure of perovskite materials
[0006] Furthermore, the production of larger areas or of layers of greater thickness remains complex and expensive

Method used

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  • Method for producing a layer with perovskite material and device with a layer of this type
  • Method for producing a layer with perovskite material and device with a layer of this type
  • Method for producing a layer with perovskite material and device with a layer of this type

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Embodiment Construction

[0059] figure 1 The installation 10 shown in is a cold gas spraying installation and in the example shown is an installation 10 known per se for the aerosol-based cold deposition of powders. Facility 10 includes vacuum chamber 20 , vacuum pump 30 , aerosol source 40 and nozzle 50 . Details regarding the structure of the installation 10 are found, for example, in US 7,553,376 B2, which can be migrated to the current installation 10 without further adjustments.

[0060] The method according to the invention is carried out by means of the installation 10 as follows: The vacuum pump 30 evacuates the vacuum chamber 20 , which means a low pressure of a few millibars, here 5 millibars. An aerosol source 40 is located outside the vacuum chamber 20 and mixes a gas (for example oxygen and / or nitrogen) with the particles 60 of perovskite material and in this way provides an aerosol 70 . For this purpose, the perovskite material is provided beforehand by means of known chemical methods....

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Abstract

The method is for producing an electro-optical and / or optoelectronic layer. In the method, the layer is formed with perovskite material of the composition ABX3 by means of cold gas spraying at least astarting material having the perovskite material. X is also formed with at least one halogen or a mixture of multiple halogens. In the method for producing an electro-optical or optoelectronic devicewith at least one electro-optical or optoelectronic layer, the at least one electro-optical or optoelectronic layer is formed with a perovskite material by means of said method. The device is in particular an electro-optical or optoelectronic device, ideally an energy converter and / or a solar cell or a light diode or an X-ray detector. The device has an electro-optical layer of this type.

Description

technical field [0001] The present invention relates to a method for producing a layer with a perovskite material, a method for producing an electro-optical and / or optoelectronic device, and a device with a layer comprising a perovskite material, in particular an electro-optic and / or optoelectronic device / or optoelectronic devices. Background technique [0002] For many years, perovskite materials, such as CH 3 NH 3 PB 3 , are increasingly important due to their optoelectronic properties. In particular, perovskite materials have drawn attention as high-efficiency, electro-optic or optoelectronic semiconductor materials because perovskites allow efficient conversion of electrical energy into electromagnetic radiation energy and vice versa. In particular, the use of perovskite materials in solar cells led to an increase in efficiency that was more than double the previous standard. [0003] In efficient semiconductor components, layers of electro-optic semiconductor mat...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C24/04H01L51/00H01L51/42
CPCC23C24/04Y02E10/549Y02E10/542Y02P70/50H10K39/36H10K71/16H10K50/11H10K85/50H10K30/50H01G9/0036H01G9/2009H10K71/811H10K85/30H10K50/135H10K2102/351H10K30/30H10K30/15C23C28/04
Inventor M.弗莱舍T.古贾尔D.汉夫特R.莫斯F.潘泽尔M.特拉卡特
Owner SIEMENS AG
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