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Wavefront sensor based on modified Hartmann mask and detection method

A wavefront sensor and an improved technology, applied in the direction of instruments, measuring devices, scientific instruments, etc., can solve the problems of limiting the application scenarios of random coded hybrid gratings, low processing yield, etc., to improve measurement accuracy, reduce processing difficulty, high Effect of Diffraction Efficiency

Active Publication Date: 2018-12-07
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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Problems solved by technology

However, the design of random coding poses challenges to the processing of amplitude gratings, and the processing yield is relatively low, which limits the application scenarios of random coding hybrid gratings

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  • Wavefront sensor based on modified Hartmann mask and detection method
  • Wavefront sensor based on modified Hartmann mask and detection method
  • Wavefront sensor based on modified Hartmann mask and detection method

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Embodiment Construction

[0036] In order to make the content, implementation process and advantages of the present invention clearer, the present invention will be further described below in conjunction with embodiment and accompanying drawing, but do not limit protection scope of the present invention with this embodiment. The numbers in the following brackets correspond to the numbers in the accompanying drawings of the specification.

[0037] A wavefront sensor based on an improved Hartmann mask, including a diffractive optical element 1-2 and a two-dimensional photodetector 1-4, the diffractive optical element is a two-dimensional grating with the same period in the orthogonal direction The structure is composed of an amplitude grating 1-2-1 with a period of T and an approximately circular light-transmitting region and a checkerboard phase grating 1-2-2 with a period of 2T and a phase gradient of π at the central wavelength; The positional relationship between the diffractive optical element and t...

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Abstract

The invention relates to a wavefront sensor based on a circular transmission area modified Hartmann mask and a detection method. The wavefront sensor comprises a diffraction element and a detector, wherein the diffraction element is a hybrid grating formed by a checkerboard phase grating and an amplitude grating with a circular transmission area. The modified Hartmann mask has a better diffractionspectrum characteristic, namely, higher + / -1-level diffraction efficiency, than a modified Hartmann mask (MHM) widely used at present when being applied to four-wavefront shearing interference, thereby further reducing system errors in differential wavefront extraction process, and improving the measurement accuracy; and the wavefront sensor simplifies the grating structure under the premise of ensuring the diffraction efficiency through properly selecting a quantification factor of the amplitude grating, and the processing difficulty of the components can be reduced. The wavefront sensor canbe applied to the field of high-precision wavefront detection.

Description

technical field [0001] The invention belongs to the field of optical wavefront detection, in particular to a shear interference wavefront sensor and detection method based on amplitude and phase hybrid gratings. Background technique [0002] High-precision wavefront measurement technology is widely used in the fields of surface shape detection of optical components, wave aberration measurement of high-resolution optical systems, astronomical observation, high-energy laser beam quality evaluation, and in vivo imaging of biological tissues. [0003] Shearing interferometry is a typical wavefront interferometry technique that does not require a standard mirror. The wavefront to be measured interferes with the superposition of the sheared wavefront after its own misalignment. Compared with traditional interference techniques such as phase-shift point diffraction interference, shearing interference technology can simplify the optical path structure and reduce the difficulty of op...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01J9/02
CPCG01J9/0215
Inventor 彭常哲唐锋王向朝冯鹏李鹏严焱
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
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