Surface enhanced raman scattering substrate and preparation method thereof
Patent Information
- Authority / Receiving Office
- CN Β· China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- NAT UNIV OF DEFENSE TECH
- Publication Date
- 2018-12-07
- Estimated Expiration
- Not applicable Β· inactive patent
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Abstract
Description
technical field
[0001] The invention relates to the technical field of spectrum detection, in particular to a surface-enhanced Raman scattering substrate and a preparation method thereof. Background technique
[0002] Surface-enhanced Raman scattering (hereinafter referred to as SERS) technology is an emerging spectral detection technology, which has great potential application prospects in the field of high-sensitivity on-site real-time biochemical detection.
[0003] According to the morphological characteristics and preparation methods of the substrates, the existing SERS substrates can be divided into three categories. The first category is metal nanostructure substrates fabricated by micronano processing, the second category is metal nanoparticle sol substrates, and the third category is metal nanoparticle assembly. base.
[0004] The commonly used processing methods for the first type of metal nanostructure substrates include focused ion beam etching, electron beam li...