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Binary mercaptan oligomer as well as preparation method and application thereof

A technology of binary mercaptan and oligomers, applied in the field of binary mercaptan oligomers and its preparation, can solve problems such as bad smell of resin, achieve small volume shrinkage, weaken mercaptan volatility, and fast polymerization rate Effect

Active Publication Date: 2019-01-08
LINGNAN NORMAL UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Even in the polythiol oligomer prepared by the patent US 5744514, it is unavoidable to be mixed with small molecular compounds, which will still cause the resin to have an unpleasant smell

Method used

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  • Binary mercaptan oligomer as well as preparation method and application thereof
  • Binary mercaptan oligomer as well as preparation method and application thereof
  • Binary mercaptan oligomer as well as preparation method and application thereof

Examples

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Effect test

Embodiment 1

[0100] This embodiment provides a kind of dibasic thiol oligomer: polyurethane dibasic thiol monomer T1 and a kind of photosensitive resin system S1, polyurethane dibasic thiol monomer T10 and photosensitive resin system S1 are prepared by following steps (such as figure 1 ).

[0101] (1) Preparation of Polyurethane Dibasic Mercaptan Monomer T1

[0102] S1: Polyurethane diol PU 1 Preparation of -OH

[0103] First 200g of hexamethylene diisocyanate (HDI) and 1.2g of triethylamine were dissolved in tetrahydrofuran, and then 230g of polyethylene glycol (number average molecular weight 200, hydroxyl value 580mg / g) was added dropwise to In the reaction solution, continue to react at 0°C for 12 hours, follow the reaction with infrared until the isocyanate group (-NCO) is at 2230cm -1 The absorption peaks at the left and right sides disappear, indicating that the reaction is complete. Underpressure distillation removes solvent and removes and obtains polyurethane binary oligomer ...

Embodiment 2

[0114] This embodiment provides a dibasic thiol oligomer: a polyurethane dibasic thiol monomer T2 and a photosensitive resin system S2. The polyurethane dibasic thiol monomer T2 and the photosensitive resin system S2 are prepared through the following steps.

[0115] (1) Preparation of Polyurethane Dibasic Mercaptan Monomer T2

[0116] S1: Polyurethane PU 2 Preparation of -OH

[0117] First the dodecamethylene diisocyanate (HDI) of 200g and the triethylamine of 0.84g are dissolved in tetrahydrofuran, the ethylene glycol of 51.7g is slowly added dropwise, then the polyethylene glycol of 1557g (number average molecular weight 2000, 60mg / g), added dropwise to the reaction solution, continued to react at 0°C for 12 hours, followed the reaction with infrared until the isocyanate group (-NCO) was at 2230cm -1 The absorption peaks at the left and right sides disappear, indicating that the reaction is complete. Underpressure distillation removes solvent and removes and obtains poly...

Embodiment 3

[0126] This embodiment provides a dibasic thiol oligomer: a polyurethane dibasic thiol monomer T3 and a photosensitive resin system S3. The polyurethane dibasic thiol monomer T3 and the photosensitive resin system S3 are prepared through the following steps.

[0127] (1) Preparation of Polyurethane Dibasic Mercaptan Monomer T3

[0128] S1: Polyurethane PU 3 Preparation of -OH

[0129] Dissolve 200g of 1,4-diisocyanatocyclohexane and 1.2g of triethylamine in tetrahydrofuran, slowly add 142g of hexanediol dropwise, and react at 50°C for 12 hours, then add 482g of polyethylene glycol Alcohol (number-average molecular weight 400, hydroxyl value 280mg / g), was added dropwise into the reaction solution, continued to react at 50°C for 12 hours, followed the reaction with infrared until the isocyanate group (-NCO) was at 2230cm -1 The absorption peaks at the left and right sides disappear, indicating that the reaction is complete. Underpressure distillation removes solvent and remov...

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Abstract

The invention discloses a binary mercaptan oligomer and a preparation method and application thereof. The structural formula of the oligomer is shown as a formula (I), a formula (II) or a formula (III) shown in the description, wherein R1 is residue obtained by reacting small-molecule dihydric alcohol with isocyanate, or residue obtained by reacting small-molecule diamine with isocyanate; the carbon chain length of the small-molecule dihydric alcohol is 2 to 10 and the carbon chain length of the small-molecule diamine is 2 to 10; R2 is residue obtained by reacting binary isocyanate with hydroxyl; the carbon atom number of a molecular main chain of the binary isocyanate is 4 to 18; R3 is residue obtained by reacting a polydiol oligomer with isocyanate functional groups and the number-average molecular weight of the polydiol oligomer is 200 to 2000. The oligomer provided by the invention has no unpleasant smell; the photosensitive resin prepared from the oligomer is also odorless and hassmaller volume shrinkage and higher polymerization rate.

Description

technical field [0001] The invention relates to the technical field of polymer materials, and more specifically, to a dibasic mercaptan oligomer and its preparation method and application. Background technique [0002] Photosensitive resins are currently widely used in the fields of coatings, adhesives, inks, light-curing rapid prototyping, and dental restorations. They have the advantages of high efficiency, energy saving, environmental protection, and wide adaptability. The principle of its curing is that the molecules contain functional groups that can initiate polymerization with light, and the resin can change from liquid to solid in a very short time. The functional groups capable of photoinitiating polymerization mainly include (meth)acrylate, epoxy group, vinyl ether and oxetane, etc. [0003] These types of photosensitive resins have their own advantages and disadvantages. For example, (meth)acrylate-based photosensitive resins have a fast polymerization rate, but ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08G18/83C08G18/32C08G18/66C08G18/48C08G75/045
Inventor 余彪潘港元杨健贾永梅李建鹏周晓平宋秀美杨桂珍
Owner LINGNAN NORMAL UNIV
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