Preparation method of low dislocation indium antimonide (111) direction single crystal

An indium antimonide and low dislocation technology, which is applied in the field of preparation of low dislocation indium antimonide oriented single crystals, can solve problems such as difficulty in drawing and easy occurrence of polycrystals, and achieve the effects of reducing dislocations, stabilizing performance, and broadening applications

Inactive Publication Date: 2019-01-29
云南昆物新跃光电科技有限公司
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AI Technical Summary

Problems solved by technology

However, the difficulty in preparing indium antimonide single crystals is to reduce dislocations. The device technology requires low or no dislocations for materials. The dislocation density of indium antimonide single crystals prepared by ordinary methods is at least several hundred per square centimeter. At present, there are relatively few studies on InSb direction low dislocation single crystals, and there is no report on the pulling method of InSb direction low dislocation single crystals, mainly because of the structure of direction single crystals Influenced by the influence, polycrystalline is easy to appear in the crystal pulling process, and it is difficult to pull a low dislocation single crystal with complete direction.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0026] Using the same steps and process conditions as Comparative Example 1 to prepare indium antimonide Direction of single crystal, after the end of the crystal pulling process of the conical end section, stop the rotation of the crucible, the rotation of the seed crystal and the pulling of the seed crystal, and reduce the heating power to make the indium antimonide The temperature of the surface of the single crystal in the direction drops to 300℃, and keeps it at 300℃ for 48h, and then continues to reduce the heating power to ensure that the indium antimonide is reduced at a temperature drop rate of 35℃ / h. The temperature of the single crystal is cooled down to room temperature, and then placed for 18 hours before taking it out to obtain low dislocation indium antimonide Direction single crystal.

[0027] To the prepared low dislocation indium antimonide The iso-diameter section of the single crystal is sliced ​​in the direction, and the iso-diameter section is etched with ...

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Abstract

The invention relates to a preparation method of a low dislocation indium antimonide (111) direction single crystal, and belongs to the technical field of photoelectric materials. According to the preparation method, the temperature, the seed crystal lifting pulling speed and the shouldering angle in the crystal pulling process are mainly regulated, growth of an indium antimonide (111) direction single crystal is realized by the vertical pulling method, and the formed indium antimonide (111) direction single crystal is annealed in situ after the crystal pulling process is finished, so that thedislocation of the prepared indium antimonide (111) direction single crystal can be greatly reduced, and the dislocation density of a large size indium antimonide (111) direction single crystal witha diameter of about 50 mm is lower than 30 / cm<2>. The performance of an infrared detector prepared from the low dislocation indium antimonide (111) direction single crystal is relatively stable. The method greatly broadens the application of the indium antimonide (111) direction single crystal in infrared detectors.

Description

Technical field [0001] The invention relates to a low dislocation indium antimonide <111> The preparation method of directional single crystal belongs to the technical field of optoelectronic materials. Background technique [0002] Indium antimonide is the material with the narrowest band gap and the largest mobility among the III-V compound semiconductors. Its physical and chemical properties are stable and it is widely used in infrared detectors and Hall devices. The quantum efficiency of infrared detectors is closely related to the selected infrared sensitive materials. Indium antimonide has high quantum efficiency in the 3μm~5μm band. In addition, indium antimonide has low cost in preparing infrared detectors. Indium antimonide infrared detection With its important military applications and broad prospects in civilian use, the device has attracted more and more attention. In addition, in order to adapt to the large-scale development trend of indium antimonide infrared...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C30B29/40C30B15/36
CPCC30B15/36C30B29/40
Inventor 刘世能李忠良叶薇陈建才何雯瑾太云见赵鹏黄晖
Owner 云南昆物新跃光电科技有限公司
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