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Thin-film LED (Light Emitting Diode) substrate for printing, thin-film LED device and preparation method thereof

A substrate and thin-film technology, applied in thin-film LED devices and its preparation, and in the field of thin-film LED substrates for printing, can solve problems such as cumbersome preparation process, unfavorable ink printing of thin-film LED functional layers, and complex groove substrate structure, and achieve High design flexibility, simplified process complexity, and the effect of preventing cross-color

Active Publication Date: 2019-01-29
武汉国创科光电装备有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] The purpose of the present invention is to provide a thin-film LED substrate for printing and its preparation method, aiming to solve the problems of the existing printing groove substrate with complex structure, complicated preparation process, and unfavorable printing of thin-film LED functional layer ink

Method used

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  • Thin-film LED (Light Emitting Diode) substrate for printing, thin-film LED device and preparation method thereof
  • Thin-film LED (Light Emitting Diode) substrate for printing, thin-film LED device and preparation method thereof

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preparation example Construction

[0036] Correspondingly, combine figure 1 , an embodiment of the present invention provides a method for preparing a thin film LED substrate for printing, comprising the following steps:

[0037] S01. deposit graphene layer 2 ' on substrate 1;

[0038] S02. Patterning the graphene layer 2' to obtain a patterned graphene layer 2, and modifying the surface of the patterned graphene layer 2 away from the substrate 1 to obtain a pattern with active functional groups on the surface graphene layer 2;

[0039] S03. Depositing a hydrophobic material on the surface of the patterned graphene layer 2 to obtain a hydrophobic layer 3.

[0040] Specifically, in the above step S01, the method for depositing the graphene layer on the substrate 1 is not strictly limited, and direct deposition or transfer deposition may be used. The choice of graphene in the embodiment of the present invention is not strictly limited, and single-layer graphene or multi-layer graphene can be used.

[0041] In...

Embodiment 1

[0079] A method for preparing a printed QLED device, comprising the following steps:

[0080] E11. Prepare QLED substrate for printing, including

[0081] E111. Depositing a graphene layer on a glass substrate, etching the graphene layer to form a pattern by plasma etching, so that the etched area is a groove with a regular pixel array;

[0082] E112. Using concentrated sulfuric acid to activate the surface of patterned graphene and introduce active functional groups to obtain patterned graphene oxide; form a polymethyl methacrylate layer on the surface of the patterned graphene oxide to obtain a QLED substrate for printing . Wherein, the area not covered with graphene forms the pixel array groove.

[0083] E12. Deposit ITO anode sequentially in the groove area in the QLED substrate for printing, print PEDOT hole injection layer, TFB hole transport layer, CdSe / ZnS quantum dot light-emitting layer, ZnO electron transport layer, evaporate Al cathode , to obtain printed quantum ...

Embodiment 2

[0085] A method for preparing a printed OLED device, comprising the following steps:

[0086] E21. Preparation of OLED substrate for printing, including

[0087] E211. Deposit a layer of graphene on a glass substrate, etch and pattern the graphene layer by plasma etching, so that the etched area is a groove with a regular pixel array;

[0088] E212. Using concentrated sulfuric acid to activate the surface of patterned graphene and introduce active functional groups to obtain patterned graphene oxide; form a polymethyl methacrylate layer on the surface of the patterned graphene oxide to obtain an OLED substrate for printing . Wherein, the area not covered with graphene forms the pixel array groove.

[0089] E22. Deposit ITO anode sequentially in the groove area in the OLED substrate for printing, print PEDOT:PSS hole injection layer, NPB hole transport layer, Alq3 light-emitting layer / electron transport layer, and evaporate Al cathode to obtain a printed OLEDs.

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Abstract

The invention provides a thin-film LED (Light Emitting Diode) substrate for printing. The thin-film LED substrate for printing is a grooved substrate and includes a substrate and a patterned compositelayer arranged on the substrate, wherein the patterned composite layer encloses to form a pixel array groove, the patterned composite layer includes a patterned graphene layer arranged on the substrate and a hydrophobic layer combined on the surface of the patterned graphene layer, and the patterned graphene layer is modified with active functional groups on the surface back to the substrate.

Description

technical field [0001] The invention belongs to the technical field of light-emitting diodes, and in particular relates to a thin-film LED substrate for printing, a thin-film LED device and a preparation method thereof. Background technique [0002] In recent years, with the advancement of science and technology, display technology has achieved rapid development. Modern display technology is divided into cathode ray tube (Cathode Ray Tube, CRT) and flat panel display (Flat Panel Display, FPD) according to the main way of information display. In the current market, the traditional CRT technology has basically faded out on the historical stage of display technology, while various new flat panel display technologies are gradually emerging. Among flat panel display technologies, Light Emitting Diode (LED) technology has outstanding advantages in terms of color performance and energy saving compared with Liquid Crystal Display (LCD), and has become a new type with great developm...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L51/00H01L51/50H01L51/56H10K99/00
CPCH10K77/10H10K50/00H10K71/00Y02E10/549
Inventor 曹蔚然梁柱荣刘佳
Owner 武汉国创科光电装备有限公司
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