AND/OR logic gate circuit based on two-dimensional semiconductor heterojunction and its realization and preparation method
A two-dimensional semiconductor, logic gate circuit technology, applied in the field of nanoelectronics
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Embodiment 1
[0048] Example 1. Preparation of devices for forming AND / OR logic gates based on two-dimensional semiconductor heterojunctions
[0049] like image 3 As shown, the device part of the AND / OR logic gate circuit based on the two-dimensional semiconductor heterojunction in this embodiment includes a gate electrode 0, an insulating substrate 1, and a first two-dimensional semiconductor material 2 on the insulating substrate 1. The material There is a second two-dimensional semiconductor material 3 and a third two-dimensional semiconductor material 4 above to form a vertical stack, the first metal electrode A is located above the second two-dimensional semiconductor material 3, and the second metal electrode B is located on the third two-dimensional semiconductor material 4, the third metal electrode Y is located above the first two-dimensional semiconductor material 2.
[0050] The method for preparing the device part of the above-mentioned two-dimensional semiconductor heterojunc...
Embodiment 2
[0058] Embodiment 2. Realization of an AND / OR logic gate circuit based on a two-dimensional semiconductor heterojunction
[0059] The third metal electrode of the two-dimensional semiconductor heterojunction device prepared in Example 1 is externally connected with a fixed resistor (R1 or R2) to form an AND / OR logic gate circuit. When realizing the AND logic function, one end of the external fixed resistor R1 is connected to the common electrode of the device—the third metal electrode Y, and the other end is connected to the power supply voltage V DD ,like figure 1 As shown; when implementing the OR logic function, one end of the external fixed resistor R2 is connected to the third metal electrode Y of the device, and the other end is grounded V SS ,like figure 2 shown.
[0060] For AND logic, see figure 1 , image 3 and Figure 5 In (a), the realization process is as follows: when the grid voltage V G When it is a negative value, the first two-dimensional semiconducto...
Embodiment 3
[0062] Embodiment 3. Implementation of a dual-function AND / OR logic gate circuit based on a two-dimensional semiconductor heterojunction
[0063] The third metal electrode Y of the two-dimensional semiconductor heterojunction device prepared in Example 1 is externally connected with a PMOS transistor M1, an NMOS transistor M2, and two fixed resistors R1 and R2 to form a dual-function AND / OR logic gate circuit. The PMOS transistor M1 and the NMOS transistor M2 share a gate electrode with the two-dimensional semiconductor heterojunction device. The drain terminal of the PMOS transistor M1 is connected to the common electrode of the device—the third metal electrode Y, the source terminal is connected to a fixed resistor R1, and the other end of R1 is connected to the power supply voltage V DD . The drain terminal of the NMOS transistor M2 is connected to the common electrode of the device—the third metal electrode Y, the source terminal is connected to the fixed resistor R2, and...
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