Inert metal n- type dopant and application thereof to organic electroluminescent devices
A technology of inert metals and dopants, applied in the field of organic electroluminescent devices, can solve the problems of unclear mechanism of action, difficulty in long-term storage and use, unfavorable industrial production, etc., and achieve stable evaporation atmosphere, convenient storage and use , is conducive to the effect of industrial production
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
preparation example Construction
[0033] The preparation process of the organic electroluminescent device of the present invention is the same as the prior art, wherein the preparation method of the electron transport layer 08 is a conventional vacuum evaporation technique.
[0034] The vapor deposition rate of the metal should be slower, 0.1 angstroms / sec. At this rate, the contact between the host material of the electron transport layer and the compound with the doping material with coordination properties and the inert metal is more sufficient, so that the inert metal M and The ligand Ligand is more uniformly dispersed in the host material ETM, which is conducive to compounding.
Embodiment 1
[0036] Single electronic device structure:
[0037] ITO / Bphen(100nm) / Ag or Au: ETM: Ligand=(1:1:10, 1:1:5, 1:2:5, 1:2:10, 5-100nm) / Al;
[0038] The first electrode layer 02 (anode ITO) / hole blocking layer 07 (Bphen) / electron transport layer 08 (x%M-Ligand-ETM) / the second electrode layer 03 (cathode Al).
[0039] The ETM structure of the host material of the electron transport layer in this embodiment is shown in the following formula (a), and the doped inert metal is Ag or Au.
[0040]
[0041] Such as figure 2 As shown, device 1 is the curve corresponding to ETM / Al, device 2 is the curve corresponding to Ag-ETM-Ligand1 / Al, device 3 is the curve corresponding to Ag-ETM-Ligand2 / Al, and device 4 is Au-ETM-Ligand1 / The curve corresponding to Al, device 5 is the curve corresponding to Au-ETM-Ligand2 / Al, the cathodes of devices 1-5 are all Al, where:
[0042] The electron transport layer 08 of the device 1 is an electron transport material represented by formula (a) (that is, it is not do...
Embodiment 2
[0049] Device structure:
[0050] ITO / HAT-CN(10nm) / NPB(30nm) / Alq 3 (30nm) / Bphen(20nm) / x%M-Ligand-ETM10nm / Ag;
[0051] The first electrode layer 02 (anode ITO), hole injection layer 04 (HAT-CN), hole transport layer 05 (NPB), light emitting layer 06 (Alq 3 ), hole blocking layer 07 (Bphen), electron transport layer 08 (x%M-Ligand-ETM), second electrode layer 03 (cathode Ag).
[0052] The host material of the electron transport layer in this embodiment is TPBI, which has the following structure:
[0053]
[0054] The selection of the host material, doped inert metal and ligand compound of the electron transport layer in this embodiment, as well as the composition ratio x% and doping ratio of the dopant are shown in Table 1 below, and the existing Active metal doping is the control device.
[0055] Table 1 Material selection of each device
[0056] Part number
[0057] It can be seen that the solution of the present invention will dope the n-type dopant with existing conventional electr...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More 


