Electric field analysis method of electromagnetic pulse nano-semiconductor device
A nano-semiconductor and electromagnetic pulse technology, applied in the field of electric field analysis, can solve problems such as huge amount of calculation and waste of time, and achieve the effect of flexible modeling, less unknowns, and saving computing time.
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[0042] The present invention is an electric field analysis method of a nanometer semiconductor device under the action of an electromagnetic pulse. The method adopts the time-domain spectral element method to solve the density gradient equation group. The density gradient equation group is a nonlinear equation group, so the discontinuous Galerkin time-domain spectrum is used. The elemental method calculates the instantaneous carrier concentration, potential distribution and carrier Fermi potential of semiconductor devices under the action of electromagnetic pulse and voltage, and obtains the electric field strength and current density at the current moment. This analysis method is based on the MOSFET physical model. Under the same electromagnetic pulse and voltage, the field change in the channel region is more severe, and the field change in the substrate region is relatively flat. Therefore, discontinuous meshing can be carried out, and the channel region can be The fine grid...
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