Drift detector and method for making the same
A manufacturing method and detector technology, applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of deep space exploration and astrophysics research difficulties, failure to achieve good results, order quantity restrictions, etc., to achieve good ohmic contact , simple operation, large area effect
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[0038] The present disclosure provides a drift detector and a manufacturing method thereof. The drift detector has a passivation contact structure of a tunnel oxide layer, a second conductive semiconductor layer and a tunnel oxide layer below it, a third conductive semiconductor layer and a The tunnel oxide layer below it forms a tunnel oxide passivation contact structure, and the tunnel oxide passivation contact structure and the first conductive semiconductor substrate respectively form a PN junction and a high-low junction, and the PN junction forms a drift electrode and a guard ring. 1. The structure of the incident window, the structure of the anode and the ground electrode formed by high and low junctions, the drift detector achieves large area, low noise, high energy resolution, and has a simple manufacturing process, which can be mass-produced.
[0039] In order to make the purpose, technical solutions and advantages of the present disclosure clearer, the present disclo...
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