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A kind of benzoxazine modified mercapto propionate and thermosetting resin prepared therefrom

A technology of benzoxazine and acetone, applied in the preparation of sulfide, organic chemistry, etc., can solve the problem of less research on heat-resistant ultraviolet curing system

Active Publication Date: 2020-05-26
BEIJING INSTITUTE OF TECHNOLOGYGY
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there are few studies on heat-resistant UV curing systems at home and abroad.

Method used

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  • A kind of benzoxazine modified mercapto propionate and thermosetting resin prepared therefrom
  • A kind of benzoxazine modified mercapto propionate and thermosetting resin prepared therefrom
  • A kind of benzoxazine modified mercapto propionate and thermosetting resin prepared therefrom

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] The preparation of TAIC-3SH-BOZ, the specific steps are:

[0046] 1) Preparation of 3SH-BOZ: 5.627g of trimethylolpropane tris(3-mercaptopropionate) was weighed and dissolved in an appropriate amount of acetone and poured into a three-neck flask. While stirring, two drops of di-n-butylamine were added dropwise, and then 2.000 g of benzoxazine (P-ala) in acetone solution was slowly added dropwise, and the reaction was stirred at room temperature for 18 h. The obtained product was subjected to rotary evaporation to remove acetone, and dried in a vacuum oven for 48 hours to obtain the grafted product 3SH-BOZ.

[0047] 2) Preparation of TAIC-3SH-BOZ: Mix 3SH-BOZ obtained in 1) with triallyl isocyanurate (TAIC) according to the functional group ratio of 1:1, and then add 1% DMPA of thiol equivalent for photoinitiation Agent mix. The mixture was rolled between two glass plates to form a film, and placed in a YH-CTGGJ-1KW UV curing machine provided by Shanghai Hongxuan Exper...

Embodiment 2

[0050] The preparation of TAIC-4SH-BOZ, the specific steps are:

[0051] 1) Preparation of 4SH-BOZ: Weigh 6.515g of pentaerythritol-4-trimercaptopropionate, dissolve it in an appropriate amount of acetone, and pour it into a three-necked flask. While stirring, two drops of di-n-butylamine were added dropwise, and then 2.000 g of benzoxazine (P-ala) in acetone solution was slowly added dropwise, and the reaction was stirred at room temperature for 18 h. The obtained product was subjected to rotary evaporation to remove acetone, and dried in a vacuum oven for 48 hours to obtain the grafted product 4SH-BOZ.

[0052] 2) Preparation of TAIC-4SH-BOZ: Mix 4SH-BOZ obtained in 1) with triallyl isocyanurate (TAIC) according to the functional group ratio of 1:1, and then add 1% DMPA of thiol equivalent for photoinitiation Agent mix. The mixture was rolled between two glass plates to form a film, and placed in a YH-CTGGJ-1KW UV curing machine provided by Shanghai Hongxuan Experimental I...

Embodiment 3

[0055] The preparation of TAIC-4SH-BOZ-3%MA0717, the specific steps are:

[0056] 1) Preparation of 4SH-BOZ: Weigh 6.515g of pentaerythritol-4-trimercaptopropionate, dissolve it in an appropriate amount of acetone, and pour it into a three-neck flask. While stirring, two drops of di-n-butylamine were added dropwise, and then 2.000 g of benzoxazine (P-ala) in acetone solution was slowly added dropwise, and the reaction was stirred at room temperature for 18 h. The obtained product was subjected to rotary evaporation to remove acetone, and dried in a vacuum oven for 48 hours to obtain the grafted product 4SH-BOZ.

[0057] 2) Preparation of 4SH-MA0717: Weigh an appropriate amount of pentaerythritol-4-trimercaptopropionate, dissolve it in an appropriate amount of acetone, and pour it into a three-neck flask. Add two drops of di-n-butylamine dropwise while stirring, then slowly drop into the acetone solution containing POSS MA0717 equimolar to pentaerythritol-4-trimercapto propion...

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Abstract

In the invention, POSS is added into a pentaerythritol-4-trimethylolpropionate / TAIC photocuring system containing benzoxazine, and tests show that the addition of the POSS can improve 5% of the initial decomposition temperature Ti of the TAIC-4SH-BOZ photocuring system and the mass residual rate at 800 DEG C; and the glass transition temperature of the TAIC-4SH-BOZ photocuring system can be increased by adding POSS MA0717 and POSS MA0734.

Description

technical field [0001] The invention relates to a synthesis method of a thermosetting resin containing N and S, belonging to the technical field of heat-resistant materials. Background technique [0002] Benzoxazine is an organic heterocyclic compound containing N and O six-membered rings. It has a series of advantages such as excellent thermal stability, good flame retardancy and excellent electrical insulation. It is used in electronic appliances, automobile manufacturing, It has a wide range of applications in medical equipment and other fields. [0003] Polyhedral oligomeric silsesquioxane (POSS) is a nano-hybrid filler with a cage structure. Its structure is mainly a three-dimensional cage structure connected by Si-O-Si bonds. It has excellent high temperature resistance, good Flame retardancy and oxygen resistance, etc., are widely used in the preparation of high temperature resistant composite materials. [0004] As a new type of green industrial technology, UV curi...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07C323/52C07C319/14C08G75/045
Inventor 李向梅刘奔奔王慧玲杨荣杰
Owner BEIJING INSTITUTE OF TECHNOLOGYGY