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Graphene-semiconductor heterojunction-based bit sensitive photoelectric detector

A photodetector and semiconductor technology, applied in the field of photodetection, can solve the problems of increasing photoelectric responsivity, low photoelectric responsivity, and enhancing light absorption, and achieve the effects of increasing photoelectric responsivity, enhancing light absorption, and enhancing sensitivity

Inactive Publication Date: 2019-05-17
SOUTHEAST UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0006] Technical problem: The object of the present invention is to provide a position-sensitive photodetector based on a graphene-semiconductor heterojunction. The local field enhancement and light trapping effect of the plasmon structure in the position-sensitive photodetector enhances the The light absorption in the depletion layer formed by the ene-semiconductor heterojunction increases the photoelectric responsivity, thereby enhancing the sensitivity of position detection, and also improves the minimum optical signal intensity that the device can detect. In addition, it can also improve the detector It overcomes the shortcomings of low photoelectric responsivity, difficulty in detecting weak light signals, and slow response time of existing position sensitive detectors.

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  • Graphene-semiconductor heterojunction-based bit sensitive photoelectric detector

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Embodiment 1

[0030] A site-sensitive photodetector based on a graphene-semiconductor heterojunction, such as figure 1As shown, the structure of the bit-sensitive photodetector is metal back electrode 1, semiconductor layer 2 and opening insulating layer 3 from bottom to top, wherein the openings of opening insulating layer 3 are covered with graphene layer 4, and graphite The edge of the graphene layer 4 extends out of the opening of the opening insulating layer 3, and is tiled on the upper surface of the opening insulating layer 3; the upper surface of the graphene layer 4 tiled on the opening insulating layer 3 is provided with a level X The metal counter electrode in the axial direction and the metal counter electrode in the direction perpendicular to the Y axis; the upper surface of the graphene layer 4 covering the opening of the opening insulating layer 3 is decorated with a plasmonic metal nanostructure 6 .

[0031] The metal back electrode 1 and the semiconductor layer 2 form an oh...

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Abstract

The invention discloses a graphene-semiconductor heterojunction-based bit sensitive photoelectric detector. The detector structure sequentially comprises a metal back electrode 1, a semiconductor layer 2 and a hole insulation layer 3 from bottom to top, wherein a graphene layer 4 covers a hole of the hole insulation layer 3, an edge of the graphene layer 4 extends out of the hole of the hole insulation layer 3 an is laid on an upper surface of the hole insulation layer 3, a metal counter electrode in a horizontal X-axis direction and a metal counter electrode in a vertical Y-axis direction arearranged on an upper surface of the graphene layer 4 laid on the upper surface of the hole insulation layer 3, and a plasmon metal nanometer structure 6 is modified on the upper surface of the graphene layer 4 covering the hole of the hole insulation layer 6. The bit sensitive photoelectric detector proposed by the invention has the characteristics of rapid response speed and high position detection sensitivity and has a good application prospect in the field of photoelectric signal detection, and a weak optical signal can be detected.

Description

technical field [0001] The invention relates to a position-sensitive photodetector based on graphene-semiconductor heterojunction, belonging to the field of photoelectric detection. technical background [0002] As a device that converts optical signals into electrical signals, photodetectors have been used in many fields such as spectral detection, imaging, and monitoring. Photodetectors based on the vertical photovoltaic effect or photoconductive effect can be combined with other optical elements to detect the wavelength, intensity, and polarization phase information of incident light. The photodetection based on the transverse photovoltaic effect can realize the position-sensitive photodetection, because it can accurately measure the relative physical variables such as the position distance and the offset angle, and the position-sensitive photodetector based on the transverse photoelectric effect is widely used in optical engineering. , aerospace and military fields. At...

Claims

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Application Information

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IPC IPC(8): H01L31/109H01L31/0352
Inventor 翟雨生王琦龙计吉焘
Owner SOUTHEAST UNIV
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