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Nb/Al multilayer film Laue lens applied to hard X-ray micro-focusing

A multi-layer film and X-ray technology, applied in the research field of precision optical components, can solve problems such as limiting the light intensity at the focal spot

Pending Publication Date: 2019-06-14
SUZHOU HONGCE PHOTOELECTRIC TECH CO LTD
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

At the same time, due to the accumulation of stress during the coating process of the multilayer film, the light aperture will be limited, which further limits the light intensity at the focal spot.

Method used

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  • Nb/Al multilayer film Laue lens applied to hard X-ray micro-focusing
  • Nb/Al multilayer film Laue lens applied to hard X-ray micro-focusing
  • Nb/Al multilayer film Laue lens applied to hard X-ray micro-focusing

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Embodiment Construction

[0023] Adopt the method of the present invention, aim at high-throughput hard X-ray focusing microscopic experiment application, design Nb / Al multilayer film Laue lens, work in E =18keV (λ=0.0666nm), f =22.5mm, dr out =15nm, R max =50μm using a tilted structure:

[0024] (1) Calculate the initial structure of the multilayer Laue lens according to the lens structure formula (1,2), and select the lens inclination angle = 2.2mrad;

[0025] (2) Using the one-dimensional coupled wave theory, calculate the negative first-order diffraction efficiency with depth z changing curve n -1 (z) ;

[0026] (3) According to the diffraction curve n -1 (z) Select the optimal depth z with the greatest efficiency opt =14.60μm;

[0027] (4) According to the optimal depth z opt , calculate the electric field distribution on the exit surface, use the Kirchhoff-Fresnel diffraction integral to obtain the light intensity distribution on the image plane, and obtain the focusing resolution...

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Abstract

The invention discloses a novel Nb / Al multilayer film Laue lens applied to hard X-ray wave band focusing. The novel Nb / Al multilayer film Laue lens is characterized in that Nb is used as an absorptionlayer of the Laue lens, and Al is used as a spacing layer. Compared with a Laue lens made of a traditional material, by using a novel material combination of Nb / Al, the higher diffraction efficiencyis achieved, the light intensity of a focusing light spot is effectively improved, the diffraction efficiency peak width calculated through the material combination is 3-4 times the diffraction efficiency peak width calculated through a traditional material combination under the same condition, the precision required during splice polishing is greatly lowered, and a preparation process is simplified. Meanwhile, stress of Al is smaller than that of a traditional Si spacing layer, the aperture of the Laue lens can be increased, thus the light transmission amount of the Laue lens is increased, the light intensity of the focusing light spot is further enhanced, and focusing performance is optimized.

Description

technical field [0001] The invention relates to the research of high-resolution X-ray micro-focusing elements, belongs to the research field of precision optical elements, and can be applied to the development of nano-scale hard X-ray micro-focusing technology. Background technique [0002] X-ray microscopy is widely used in plasma diagnosis, biomedical microscopy and other research fields due to its strong penetrating, short working wavelength, non-destructive measurement, and high sensitivity of elements. The resolution of an X-ray microscopic imaging system is determined by the available focal spot size of its focusing element. Since the refractive index n value of X-rays is close to 1, the diffractive focusing element is more convenient to realize X-ray focusing than the reflection and refraction elements. The traditional diffractive focusing element is a Fresnel zone plate. According to the Rayleigh criterion, the resolution of the Fresnel zone plate depends on the ba...

Claims

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Application Information

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IPC IPC(8): G21K1/06
CPCG21K1/062G21K1/065
Inventor 朱京涛张嘉怡朱运平金长利
Owner SUZHOU HONGCE PHOTOELECTRIC TECH CO LTD
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