A kind of bulk metal/cermet nano-gradient material based on PVD technology and its preparation method and application
A technology of cermets and gradient materials, which is applied in metal material coating process, vacuum evaporation plating, coating, etc., can solve the problem of inability to prepare high-purity bulk metal/cermet nano-gradient materials, and achieve excellent film -Effect of base binding force
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Embodiment 1
[0038] This embodiment provides a high-purity bulk Ti / TiN gradient nanomaterial, which is prepared by the following method.
[0039]Place the metal or conductive non-metallic substrate with smooth surface on the PVD equipment turret. The working surface of the target is facing the ceramic deposition surface of the substrate, and the positions of the two are fixed, and the distance between the two is 15cm. Then turn on the PVD coating machine and adjust the PVD core process parameters (Ti target current density 200A; substrate bias between -15V; deposition time 10h; nitrogen pressure adjustment in the furnace can be divided into three stages: the first stage 3h, nitrogen pressure from 0Pa gradually increased to 0.3Pa; second stage: 4h, nitrogen pressure gradually increased from 0.3Pa to 0.8Pa; third stage: 3h, nitrogen pressure gradually increased from 0.8Pa to 3.0Pa.) and non-core process parameters (PVD furnace The inner vacuum is less than 1×10 -3 Pa, argon flow control 100...
Embodiment 2
[0044] This embodiment provides a high-purity bulk Cr / CrN gradient nanomaterial, which is prepared by the following method.
[0045] Place the metal or conductive non-metallic substrate with smooth surface on the PVD equipment turret. The working surface of the target is facing the ceramic deposition surface of the substrate, and the positions of the two are fixed, and the distance between the two is 15cm. Then turn on the PVD coating machine and adjust the PVD core process parameters (Cr target current density 200A; substrate bias voltage is -15V; deposition time 10h; nitrogen pressure adjustment in the furnace can be divided into three stages: the first stage 3h, nitrogen pressure from 0Pa Gradually increased to 0.3Pa; second stage: 4h, nitrogen pressure gradually increased from 0.3Pa to 0.8Pa; third stage: 3h, nitrogen pressure gradually increased from 0.8Pa to 3.0Pa.) and non-core process parameters (PVD furnace Vacuum degree is less than 1×10 -3 Pa, argon flow control 10...
Embodiment 3
[0049] This embodiment provides a high-purity bulk AlCr / AlCrN gradient nanomaterial, which is prepared by the following method.
[0050] Place the metal or conductive non-metallic substrate with smooth surface on the PVD equipment turret. The working surface of the target is facing the ceramic deposition surface of the substrate, and the positions of the two are fixed, and the distance between the two is 15cm. Then turn on the PVD coating machine and adjust the PVD core process parameters (Al 50 Cr 50 Target current density 180A; substrate bias -15V; deposition time 10h; nitrogen pressure adjustment in the furnace can be divided into three stages: first stage 3h, nitrogen pressure gradually increased from 0Pa to 0.3Pa; second stage: 4h, nitrogen pressure Gradually increase from 0.3Pa to 0.8Pa; the third stage: 3h, the nitrogen pressure gradually increases from 0.8Pa to 3.0Pa.) and non-core process parameters (the vacuum degree in the PVD furnace is less than 1×10 -3 Pa, argo...
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