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Preparation method of molybdenum target material

A molybdenum target and rolling direction technology, which is applied in the field of sputtering target preparation, can solve problems such as insufficient purity, uneven texture distribution, and affecting the sputtering performance of molybdenum sputtering targets

Inactive Publication Date: 2019-07-12
HENAN UNIV OF SCI & TECH
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  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

The molybdenum plate rolled by the traditional method has uneven texture distribution in the thickness direction of the plate, and the existence of texture gradient will affect the sputtering performance of the molybdenum sputtering target
The Chinese invention patent application with the application publication number CN103567445A discloses a method for preparing a molybdenum target. The technical solution is to densify the molybdenum powder by static pressing, cold isostatic pressing, and induction sintering, and then pass hot rolling Rolling and annealing treatment to obtain molybdenum target material, the purity of the molybdenum target material obtained by this method is not less than 99.95%, but its purity is not high enough

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  • Preparation method of molybdenum target material

Examples

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Embodiment 1

[0022] The preparation method of the molybdenum target material of the present embodiment comprises the following steps:

[0023] (1) The molybdenum powder raw material with a purity of 99.95%, a particle size of 2 μm, uniform particle size, normal distribution, good dispersibility, and no obvious agglomeration phenomenon is first charged, and then cold isostatically pressed for 15 minutes under a pressing pressure of 180 MPa to obtain molybdenum Plate green body, molybdenum plate green body was sintered by medium frequency induction under hydrogen atmosphere for 8 hours, and the sintering temperature was 1800°C, and finally a cylindrical sintered molybdenum billet was obtained;

[0024] (2) further purifying the sintered molybdenum blank obtained in step (1) by electron beam smelting to obtain the purified molybdenum blank, and its purity is 99.99%;

[0025] (3) The molybdenum billet purified in step (2) is first forged and opened, and then press-processed in a circumferentia...

Embodiment 2

[0029] The preparation method of the molybdenum target material of the present embodiment comprises the following steps:

[0030] (1) The molybdenum powder raw material with a purity of 99.97%, a particle size of 3 μm, uniform particle size, normal distribution, good dispersibility, and no obvious agglomeration is first charged, and then cold isostatically pressed for 13 minutes under a pressing pressure of 185 MPa to obtain molybdenum Plate green body, the molybdenum plate green body was sintered by medium frequency induction in a hydrogen atmosphere for 7 hours, and the sintering temperature was 1820°C, and finally a cylindrical sintered molybdenum billet was obtained;

[0031] (2) further purifying the sintered molybdenum blank obtained in step (1) by electron beam smelting to obtain the purified molybdenum blank, and its purity is 99.996%;

[0032] (3) The molybdenum billet purified in step (2) is first forged and opened, and then press-processed in a circumferential rolli...

Embodiment 3

[0036] The preparation method of the molybdenum target material of the present embodiment comprises the following steps:

[0037] (1) The molybdenum powder raw material with a purity of 99.99%, a particle size of 3 μm, a uniform particle size, a normal distribution, good dispersion, and no obvious agglomeration is first charged, and then cold isostatically pressed for 10 minutes under a pressing pressure of 200 MPa to obtain molybdenum Plate green body, the molybdenum plate green body was sintered by medium frequency induction in a hydrogen atmosphere for 6 hours, and the sintering temperature was 1850°C, and finally a cylindrical sintered molybdenum billet was obtained;

[0038] (2) further purifying the sintered molybdenum blank obtained in step (1) by electron beam smelting to obtain the purified molybdenum blank, and its purity is 99.999%;

[0039] (3) The molybdenum billet purified in step (2) is first forged and opened, and then press-processed in a circumferential rolli...

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Abstract

The invention relates to a preparation method of a molybdenum target material, and belongs to the technical field of sputtering target material preparation. The preparation method of the molybdenum target material comprises the following steps that a molybdenum raw material is firstly sintered into a molybdenum blank; purification is carried out through an electron beam smelting method; and then the molybdenum target material is obtained through peripheral rolling and vacuum annealing treatment. By means of the method, the problems that the impurity content of the molybdenum target material ishigh, and structure distribution is not uniform are solved; the purity and density of the molybdenum target material prepared through the method are higher, and structure distribution of the target material is more uniform; and specific crystal orientation can be formed, and the sputtering performance of the molybdenum target material is better.

Description

technical field [0001] The invention relates to a method for preparing a molybdenum target, which belongs to the technical field of sputtering target preparation. Background technique [0002] Molybdenum and molybdenum alloys have excellent properties such as good electrical and thermal conductivity, low thermal expansion coefficient, good corrosion resistance and environmental friendliness. The specific impedance and film stress of molybdenum thin films are only half of that of chromium. In electronic components and electronic products, such as thin film semiconductor tube-liquid crystal display (TFT-LCD), plasma display, field emission display, touch screen, it can also be used in the back electrode of solar cells, glass coating and other fields. The target material requires high purity, density and specific texture. The molybdenum target prepared by the traditional powder metallurgy method has the disadvantages of high impurity content and low density. Rolling is a comm...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34C23C14/14
CPCC23C14/14C23C14/3414
Inventor 谢敬佩陈艳芳苌清华马窦琴赵海丽毛爱霞王爱琴王文焱
Owner HENAN UNIV OF SCI & TECH
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