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A kind of surface-enhanced Raman spectroscopy silver-plating active substrate and preparation method thereof

A surface-enhanced Raman and active substrate technology, applied in Raman scattering, material analysis through optical means, instruments, etc., can solve the complex process of SERS active substrate, the difficulty of preparing large-area uniform substrate samples, and high preparation costs. problem, to achieve good surface-enhanced Raman scattering, large-area uniform deposition, and improved enhancement effect

Active Publication Date: 2021-02-19
JIAXING UNIV
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  • Abstract
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Problems solved by technology

[0005] What is needed in SERS detection is an active substrate with good stability, small signal deviation, and high sensitivity. Although there are many theoretical studies and experimental methods related to the preparation of SERS active substrates using silver in related technologies, the process flow for preparing SERS active substrates in related technologies It is more complicated, the preparation cost is higher, the uniformity is poor, and it is difficult to prepare large-area and uniform substrate samples

Method used

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  • A kind of surface-enhanced Raman spectroscopy silver-plating active substrate and preparation method thereof
  • A kind of surface-enhanced Raman spectroscopy silver-plating active substrate and preparation method thereof
  • A kind of surface-enhanced Raman spectroscopy silver-plating active substrate and preparation method thereof

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preparation example Construction

[0042] figure 1 It is a method flowchart of a method for preparing a surface-enhanced Raman spectrum silver-plated active substrate shown according to an exemplary embodiment, such as figure 1 Shown, the preparation method of this surface-enhanced Raman spectrum silver-plated active substrate comprises:

[0043] Step 100: configure the plating solution at room temperature, the components of the plating solution include 10-15 g / L AgNO 3 , 35~45g / L 5-ureidohydantoin, 10~15 g / L isonicotinic acid, 35~45 g / L K 2 CO 3 , 0.1-0.4 g / L grain refiner and 0.05-0.2 g / L other additives, the pH of the plating solution is adjusted to 7-8 by KOH solution.

[0044] It should be noted that, in the plating solution provided by the embodiment of the present invention, AgNO 3 As the main salt, 5-ureidohydantoin as the main complexing agent, isonicotinic acid as the auxiliary complexing agent, K 2 CO 3 As a conductive salt, use KOH solution to adjust the pH to 7~8.

[0045] In a preferred emb...

Embodiment 1

[0078] (1) At a temperature of 42°C, place the copper in absolute ethanol for 15 minutes and then clean it with deionized water and dry it. The ultrasonic power used in the ultrasonic cleaning process is 80%.

[0079] (2) At a temperature of 40°C, place the ultrasonically cleaned copper in a degreasing solution for cathodic electrochemical degreasing treatment for 5 minutes, then wash and dry it with deionized water. The current density used in the cathodic electrochemical degreasing process is 4A / dm 2 .

[0080] (3) At a temperature of 45°C, put the red copper after cathodic electrochemical degreasing treatment in the polishing solution for anodic electropolishing treatment, then use deionized water to clean and dry, and the current density used in the anodic electrolytic polishing treatment process is 7A / dm 2 .

[0081] (4) Heat the plating solution to 42°C by heating in a water bath, then place red copper in the plating solution, use red copper as the cathode, and use th...

Embodiment 2

[0083] (1) At a temperature of 45°C, place the copper in absolute ethanol for 15 minutes and then clean it with deionized water and dry it. The ultrasonic power used in the ultrasonic cleaning process is 80%.

[0084] (2) At a temperature of 40°C, place the ultrasonically cleaned copper in a degreasing solution for cathodic electrochemical degreasing treatment for 5 minutes, then wash and dry it with deionized water. The current density used in the cathodic electrochemical degreasing process is 4A / dm 2 .

[0085] (3) Under the temperature condition of 42°C, put the red copper after cathodic electrochemical degreasing treatment in the polishing solution for anodic electropolishing treatment, then use deionized water to clean and dry, and the current density used in the anodic electrolytic polishing treatment process is 8A / dm 2 .

[0086] (4) Heat the plating solution to 42°C by heating in a water bath, then place red copper in the plating solution, use red copper as the cath...

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Abstract

The invention discloses a surface-enhanced Raman spectrum silver-plated active substrate and a preparation method thereof, and relates to the technical field of Raman spectrum detection. The present invention provides a surface-enhanced Raman spectrum silver-plated active substrate and a preparation method thereof. Copper is used as a cathode, a silver plate is used as an anode, and the main complexing agent, auxiliary complexing agent, grain refiner, and Flash plating and subsequent normal electroplating are carried out in the plating solution of conductive salt and other additives. During electroplating, the area ratio of cathode and anode is controlled to prepare a highly active silver-plated substrate. The preparation process is simple, efficient, and environmentally friendly. The surface of the prepared silver-plated active substrate is The silver grains are finely crystallized and uniformly deposited in a large area, and have a good Surface-enhanced Raman Scattering (SERS) effect of the Raman scattering spectrum, thereby solving the traditional process of preparing SERS active substrates using silver flakes. High, and the SERS activity of the substrate is poor and other technical problems, so as to improve the preparation efficiency of the SERS active substrate and improve the enhancement effect of the substrate.

Description

technical field [0001] The invention relates to the technical field of Raman spectrum detection, in particular to a surface-enhanced Raman spectrum silver-plated active substrate and a preparation method thereof. Background technique [0002] Raman spectroscopy has the advantages of simple preparation of detection materials and no damage to test samples in analysis and detection, and is widely used in single molecule detection, chemical engineering, biomedicine, nanomaterials and other fields. [0003] Due to the weak intensity of Raman scattering, its application is limited. Fleischmann et al. adsorbed organic molecules on the surface of roughened noble metal materials, and found that the Raman signal was significantly enhanced, even to more than ten orders of magnitude, and called it Surface-enhanced Raman Scattering (Surface-enhanced Raman Scattering, SERS) effect. Therefore, the preparation of SERS active substrates becomes the key to its application. Among them, the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C25D3/46C25D5/34C25D5/18C25D17/10C25F1/04C25F3/22G01N21/65
CPCC25D3/46C25D5/18C25D5/34C25D17/10C25F1/04C25F3/22G01N21/658
Inventor 赵健伟赵博儒孙志
Owner JIAXING UNIV
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