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Motion detecting device, preparation method and application

A technology of motion detection and spin coating, which is applied in the direction of measuring devices, using electrical devices, using electromagnetic means, etc., can solve the problems of structure and preparation method defects, poor detection effect, etc., to reduce thickness, improve performance, improve sensitivity and The effect of accuracy

Active Publication Date: 2019-07-23
SHENZHEN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, due to the defects in the structure and preparation method of the motion device detection device containing MXene materials, the detection effect is poor. Therefore, it is urgent to develop a motion detection device with excellent detection effect.

Method used

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  • Motion detecting device, preparation method and application
  • Motion detecting device, preparation method and application
  • Motion detecting device, preparation method and application

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Experimental program
Comparison scheme
Effect test

preparation example Construction

[0051] Please refer to Figure 4 , an embodiment of the present invention provides a method for manufacturing a motion detection device, including:

[0052] Step 1: Take MAX raw material, prepare the MAX raw material into MXene solution, and then prepare the MXene solution into MXene layer 1;

[0053] Step 2: setting a positive electrode 3 and a negative electrode 4 on the surface of the MXene layer 1;

[0054] Step 3: Prepare a protective layer 2 on the surface of the MXene layer 1, the positive electrode 3 and the negative electrode 4 by spin coating;

[0055] Step 4: removing the protective layer 2 on the surface of the positive electrode 3 and the negative electrode 4 to expose one side surface of the positive electrode 3 and the negative electrode 4 to obtain a motion detection device.

[0056] When the protective layer 2 is prepared on the surfaces of the MXene layer 1, the positive electrode 3 and the negative electrode 4, due to the limitations of the process, the pr...

Embodiment 1

[0083] Embodiment 1: the present invention provides a kind of preparation method of motion detection device, comprising:

[0084] Step 1: Take 0.1 g of 500 mesh titanium aluminum carbide and 9 ml of hydrofluoric acid with a mass fraction of 40% to react in a water bath environment at 45° C. for 24 hours to obtain a mixed solution. Then the mixed solution was subjected to ultrasonic operation for 60 min, followed by 5 centrifugation operations, the rotating speed of each centrifugation operation was 3500 r / min, and the time of each centrifugation operation was 10 min, so that the pH of the mixed solution was 6, and then 9 ml of isotropic acid was added. The propylamine solution was intercalated for 18 hours to obtain the MXene solution. Prepare layer MXene layer 1 with MXene solution by vacuum filtration method.

[0085] Step 2: setting a positive electrode 3 and a negative electrode 4 made of silver on the MXene layer 1 .

[0086] Step 3: Prepare a protective layer 2 on the ...

Embodiment 2

[0088] Embodiment 2: the present invention provides a kind of preparation method of motion detection device, comprising:

[0089] Step 1: Take 0.1 g of 500 mesh titanium aluminum carbide and 9 ml of hydrofluoric acid with a mass fraction of 40% to react in a water bath environment at 45° C. for 24 hours to obtain a mixed solution. Then the mixed solution was subjected to ultrasonic operation for 60 minutes, followed by 5 centrifugation operations, the rotating speed of the centrifugal operation was 3500r / min, and the time of the centrifugal operation was 10min, so that the pH of the mixed solution was 6, and then 9ml of isopropylamine solution was added for 18h Intercalation operation to obtain MXene solution.

[0090] Prepare layer MXene layer 1 by spin-coating the MXene solution. Take the silicon wafer and carry out hydrophilic treatment in hydrogen peroxide for 24 hours. Place the silicon wafer on a spin coater, first drop 3ml of PMMA on the silicon wafer, then rotate at ...

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Abstract

The invention provides a motion detecting device, and further provides a preparation method and application of the motion detecting device. The motion detecting device comprises an MXene layer, a protective layer, a positive electrode and a negative electrode, wherein the MXene layer and the protective layer are disposed in a stacked mode, the positive electrode and the negative electrode are simultaneously disposed in the MXene layer or simultaneously disposed in the protective layer, one side surfaces of the positive electrode and the negative electrode are exposed, and the spacing between the positive electrode and the negative electrode is 50-100 [mu]m. The positive electrode and the negative electrode are embedded in the MXene layer or in the protective layer to reduce the thickness of the motion detecting device. Furthermore, the spacing between the positive electrode and the negative electrode is reduced to 50-100 [mu]m to improve the sensitivity and accuracy of the motion detecting device.

Description

technical field [0001] The invention belongs to the technical field of motion detection devices, and in particular relates to a motion detection device, a preparation method and an application. Background technique [0002] In order to more conveniently detect relevant parameters of a user during exercise, wearable exercise detection devices have been continuously developed in recent years. Graphene materials are usually used as flexible materials in traditional motion detection devices, but the production process of graphene materials is relatively cumbersome, and graphene will destroy the cell structure of the human body if it is accidentally ingested into the human body. MXene (two-dimensional transition metal carbon / nitride) material is usually used now, and MXene material can not only reduce the manufacturing cost, but also will not damage the cell structure. [0003] However, due to the defects in the structure and preparation method of the current motion device detec...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01H11/06G01P13/00
CPCG01H11/06G01P13/00
Inventor 丁惠君靳雨锟温博张晗
Owner SHENZHEN UNIV