Method for Measuring Thin Film Refractive Index and Thickness by Laser Modification Based on Pl Interference Phenomenon
A refractive index, laser technology, applied in the measurement of phase influence characteristics, measurement devices, optical devices, etc., can solve problems such as changes, and achieve the effect of small damage area
Active Publication Date: 2020-05-19
BEIJING INSTITUTE OF TECHNOLOGYGY
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However, the film thickness measured by ellipsometry varies with the incident light angle and wavelength, and the measured value will also change.
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Embodiment 1
[0037] The method for measuring the refractive index and thickness of thin film by femtosecond laser modification based on Fabry-Perot interference phenomenon, comprising the following steps:
[0038] 1. Pre-treat the selected GaN-based LED, and ultrasonically clean it in absolute ethanol and deionized water for 5 minutes to make the surface of the material clean.
[0039] 2. Place the cleaned aluminum-doped zinc oxide in a femtosecond laser processing system with a center wavelength of 800nm, a pulse width of 50fs, and a repetition rate greater than 10Hz. The femtosecond laser is focused on the surface of the material through a 100mm plano-convex. The device for realizing the measurement method includes a femtosecond laser, an attenuation plate, an optical shutter, an objective lens, a six-dimensional mobile platform, a beam splitter, an imaging device and an illuminating lamp. Processing optical path: The laser light emitted by the femtosecond laser is reflected by the atten...
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Abstract
The invention relates to a PL interference phenomenon-based laser modification measurement film refractive index and thickness method, which belongs to the field of laser modification and measurement.The method, based on a femtosecond laser micro-nano processing system, comprises the following steps: a purchased GaN-based LED epitaxial wafer sample is put on an existing six-degree-of-freedom translation stage, and the laser is focused on the sample surface through a plano-convex mode. The energy of the laser can be adjusted by an attenuator, and the repetition frequency, a scanning speed anda scanning interval can be adjusted by existing procedures. A PL spectral line of the sample after processing is measured, the spectral line is subjected to subsequent analysis and calculation, and the refractive index and the thickness of the sample can be obtained. Compared with the prior art, the method analyzes the obtained spectral line through measuring the photoluminescence spectral line ofthe sample after modification by femtosecond laser, and the refractive index and the thickness of the sample can be calculated.
Description
technical field [0001] The invention relates to a method for measuring the refractive index and thickness of a film by laser modification based on PL interference phenomenon, and belongs to the field of laser modification and measurement. Background technique [0002] Optoelectronic devices such as solar cells and LEDs are closely related to our lives, and the optical properties (refractive index, thickness, etc.) of their constituent thin film materials play a vital role in the performance of the device. However, due to the limitations of various method principles or experimental methods, it is still a difficult problem to measure the refractive index and thickness simultaneously. The common methods for measuring the refractive index now include transmission line method, ellipsometry, interference method and so on. The transmission line method is a method of measuring the optical properties of thin films by using the transmittance line of the sample. The experimental proc...
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IPC IPC(8): G01N21/45G01B11/06
CPCG01B11/0675G01N21/45G01N2021/458
Inventor 姜澜孙靖雅谢钰铎
Owner BEIJING INSTITUTE OF TECHNOLOGYGY