Non-volatile spin-orbit torque element and electroresistive change effect-based non-volatile electric control spin-orbit torque method
A spin-orbit, non-volatile technology, applied in the field of information storage, can solve the problems of volatile regulation of the magnetic moment reversal process, and achieve the effect of saving energy
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Embodiment 1
[0039] Such as figure 1 As shown, a non-volatile spin-orbit torque element, including:
[0040] The substrate 1 is used to carry the element, and the substrate is a silicon-based substrate;
[0041] The first electrode 2, the first electrode material is 0.5nm Ta, which is arranged above the substrate;
[0042] The heterostructure layer 3, the heterostructure layer is arranged above the first electrode, which is a 0.5 nm thick heavy metal thin film 3-1 prepared from Pt, and a 1-2 nm thick ferromagnetic film prepared from Ni. Metal thin film 3-2 and 20nm thick CeO 2 Magnetic multilayer film structure composed of 3-3 combined deposition of resistive switching thin film;
[0043] The second electrode 4, the second electrode material is Au, which is arranged above the heterostructure layer.
Embodiment 2
[0045] A non-volatile electronically controlled spin-orbit torque method based on the electroresistive effect, the method comprising the following steps:
[0046] Preparation of the nonvolatile spin-orbit torque element in Example 1:
[0047] Substrate cleaning: immerse the silicon-based substrate in acetone, ultrasonically clean it for 10 minutes, and then wash it three times with distilled water; then immerse the silicon-based substrate in a mixture of 60% hydrogen peroxide and 98% concentrated sulfuric acid with a volume ratio of 1:1 Soak in water for 15 minutes; take it out, put it in water for 10 minutes, and then wash it with running water to get a clean substrate.
[0048] Magnetron sputtering deposits a layer of Ta first electrode with a thickness of 1 nm on the cleaned substrate;
[0049] On the first electrode, a Pt heavy metal film, a ferromagnetic Fe film and a CeO film are sequentially deposited by magnetron sputtering. 2 Resistive thin film, forming a heterogen...
Embodiment 3
[0053] A nonvolatile spin-orbit torque element comprising:
[0054] a substrate, used to carry the element, and the substrate is a silicon-based substrate;
[0055] The first electrode, the first electrode material is Au, which is arranged above the substrate;
[0056] The heterostructure layer, the heterostructure layer is arranged above the first electrode, which is a Pt heavy metal film with a thickness of 1nm, a Co film with a thickness of 1.5nm and a CeO film with a thickness of 20nm 2 Magnetic multilayer film structure composed of combined deposition of resistive switching thin films;
[0057] The second electrode, where the second electrode material is Ag, is disposed above the heterostructure layer.
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Abstract
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