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An after-sun repairing moisturizing mask for marathon exercise and preparation method thereof

A post-sun repairing and post-exercise technology, applied in cosmetic preparations, skin care preparations, medical preparations containing active ingredients, etc., can solve problems such as complex production process, easy skin irritation, single effect, etc., to achieve Small skin irritation effect

Active Publication Date: 2021-04-13
苏州榭睿迦医疗科技发展有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

At present, there is no after-sun repairing moisturizing mask specially for marathon exercise in the market. Most of the after-sun repairing products on the market contain artificially synthesized chemicals, which are easy to irritate the skin, have single effect and complicated manufacturing process, so there is an urgent need for a mask with Provides multiple after-sun repair effects such as high-efficiency hydration, relief of skin redness, reduction of burning sensation, and reduction of the appearance of pigmentation, and is a safe after-sun repair mask

Method used

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  • An after-sun repairing moisturizing mask for marathon exercise and preparation method thereof
  • An after-sun repairing moisturizing mask for marathon exercise and preparation method thereof
  • An after-sun repairing moisturizing mask for marathon exercise and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-5 and comparative example 1-5

[0028] Embodiment 1-5 and comparative example 1-5—raw material composition and preparation method of after-sun repairing moisturizing facial mask

[0029] An after-sun repairing moisturizing mask for marathon exercise, which is composed of a mask essence and a mask base material. The weight of the components contained in the mask essence is shown in Table 1-2, and is obtained by the following preparation method: (1) Weigh each raw material component by weight, and set aside; (2) Ceylon cinnamon extract, hyaluronic acid, sorbitol, carbomer, butylene glycol, triethanolamine, DMDM ​​hydantoin, appropriate amount Deionized water is placed in the container according to the stated weight and stirred evenly to obtain the mixture A; (3) Resveratrol, ferulic acid, Lacerum chinensis extract, bisabolol and remaining deionized water are prepared according to the stated weight portion Mixing and stirring evenly to obtain mixture B; (4) mixing mixture A and mixture B and stirring evenly to ...

Embodiment 6

[0037] Efficacy evaluation was performed on the after-sun repairing and moisturizing facial masks in Examples 1-5 and Comparative Examples 1-5.

[0038] Subjects: After the marathon, select 80 volunteers with different degrees of sunburn (burning sensation, redness and swelling on the skin), aged between 20 and 45.

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Abstract

The invention provides an after-sun repairing moisturizing facial mask for marathon exercise and a preparation method thereof, the raw materials of which include resveratrol, ferulic acid, Ceylon cinnamon extract, Lapis chinensis extract, and bisabolol , Hyaluronic Acid, Sorbitol, Carbomer, Butylene Glycol, Triethanolamine, DMDM ​​Hydantoin, Deionized Water. Mix five kinds of plant active ingredients—resveratrol, ferulic acid, Ceylon cinnamon extract, Liquorice lotus extract, bisabolol and other mask nutrients in a certain proportion to make a mask essence, which has a significant sun protection effect. after repair effect. Tests have shown that the above five plant active ingredients have a synergistic effect, can achieve excellent after-sun repair and moisturizing effects, quickly relieve the degree of sunburn after marathon exercise, and effectively improve the condition of sunburned skin.

Description

technical field [0001] The invention belongs to the technical field of daily chemical products, and in particular relates to an after-sun repairing moisturizing facial mask for marathon exercise and a preparation method thereof. Background technique [0002] As the popularity of domestic road running continues unabated, more and more runners have included the marathon in their list of sports. However, if you run a marathon outdoors in sufficient sunlight and wear shorts and short-sleeved sportswear, your skin will be easily sunburned if exposed to ultraviolet light for a long time. The skin is prone to redness, swelling, tingling, blisters, and peeling. If a rash occurs, it means that the skin has been allergic to the sun, and the skin should be prevented from being damaged by strong sunlight again. If blisters develop, this is a more serious sunburn and should be avoided by rubbing the skin to burst the blisters. Dermatologists have pointed out that severe sunburns are co...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): A61K8/9789A61K8/73A61K8/34A61K8/365A61Q19/00
CPCA61K8/342A61K8/345A61K8/347A61K8/365A61K8/735A61K2800/72A61K2800/84A61Q19/00A61Q19/004A61K8/9789
Inventor 张宏宇肖健许可
Owner 苏州榭睿迦医疗科技发展有限公司
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