SERS substrate and preparation method thereof

A substrate and substrate technology, applied in the field of analytical chemistry, can solve the problems of high repeatability and good reliability, and achieve the effect of simple operation, high repeatability and delivery

Inactive Publication Date: 2019-12-13
EAST CHINA UNIV OF SCI & TECH
View PDF3 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, the substrates obtained by different preparation methods have their own advantages and disadvantages. At present, there is no widely used SERS substrate with high reproducibility and good reliability.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • SERS substrate and preparation method thereof
  • SERS substrate and preparation method thereof
  • SERS substrate and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0043] In this embodiment, a SERS substrate 100 is provided, the SERS substrate has figure 1 structure shown. Wherein, the substrate 110 is made of silicon, the tip diameter of the microneedles 111 is set to 5 nanometers, the height of the microneedles 111 is set to 100 microns, and the distance between the central axes of adjacent microneedles 111 is set to 300 microns. And, the microneedles 111 are evenly distributed in 9 rows×9 columns.

[0044] The specific preparation steps of the SERS substrate are as follows.

[0045] (1) Preparation of gold nanoparticles

[0046] Heat 50mL of 1mmol / L chloroauric acid solution in a 250mL flask to boiling state, then add 1.85mL of 38.8mmol / L trisodium citrate dropwise, keep boiling and reflux for 15min, put into brown reagent bottle after cooling Save it for later use.

[0047] (2) Concentrated nanoparticles

[0048] Take 5 mL of the nano-gold sol obtained in step (1) and put it into a centrifuge, centrifuge at 5000 rpm for 5 minutes,...

Embodiment 2

[0054] In this embodiment, a SERS substrate 100 is provided, the SERS substrate has figure 1 structure shown. Wherein, the substrate 110 is made of silicon, the tip diameter of the microneedles 111 is set to 5 nanometers, the height of the microneedles 111 is set to 100 microns, and the distance between the central axes of adjacent microneedles 111 is set to 300 microns. And, the microneedles 111 are evenly distributed in 9 rows×9 columns.

[0055] The specific preparation steps of the SERS substrate are as follows.

[0056] (1) Preparation of silver nanoparticles.

[0057] Weigh 36 mg of silver nitrate and dissolve it in 200 mL of deionized water, heat the solution to boiling, slowly add 6 mL of 1% (mass fraction) trisodium citrate solution dropwise under stirring, continue stirring after the addition is complete, and keep the solution boiling for 15 min , and finally cool the prepared silver colloid to room temperature.

[0058] (2) Concentrated nanoparticles

[0059] C...

Embodiment 3

[0065] In this embodiment, a SERS substrate 100 is provided, the SERS substrate has figure 1 structure shown. Wherein, the substrate 110 is made of silicon, the tip diameter of the microneedles 111 is set to 200 nanometers, the height of the microneedles 111 is set to 200 microns, and the distance between the central axes of adjacent microneedles 111 is set to 500 microns. Moreover, the microneedles 111 are evenly distributed in 9 rows×9 columns.

[0066] The preparation method is as described in Example 1, and will not be repeated here.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
diameteraaaaaaaaaa
particle diameteraaaaaaaaaa
Login to view more

Abstract

The invention relates to an SERS substrate. An underlayer of the SERS substrate is a microneedle array containing a plurality of microneedles, wherein needle tip diameter of each microneedle is in a range from 200nm to 600nm, and space between central axes of adjacent microneedles is in a range from 50 microns to 1000 microns.

Description

technical field [0001] The invention relates to the technical field of analytical chemistry, in particular to a SERS substrate and a preparation method thereof. Background technique [0002] Surface-enhanced Raman scattering (SERS) is a new type of high-sensitivity spectroscopy technology, which is produced on nano-gold and silver substrates, and realizes the amplification of Raman spectroscopy signals through its localized surface plasmon resonance. SERS analysis has the advantages of fast response, rich fingerprint information, high sensitivity, wide detection range, and simple pretreatment. It is currently widely used in biological tissue, food safety, environmental testing, drug analysis and other fields. [0003] Raman signal enhancement is based on SERS substrates with excellent performance. Therefore, the preparation of SERS substrates with high sensitivity and good repeatability is a research hotspot and difficulty in the field of Raman spectroscopy. [0004] At pre...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/65B81B1/00B81C1/00
CPCB81B1/008B81B2201/0214B81C1/00111G01N21/658
Inventor 康燕吴婷杜一平
Owner EAST CHINA UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products