Preparation method of graphene electrode material
A graphene electrode and graphene technology, which is applied in hybrid capacitor electrodes, metal material coating technology, hybrid/electric double layer capacitor manufacturing, etc., can solve the problem of low specific capacity of electrode materials, so as to improve specific capacitance value and energy Density, strong operability, and the effect of improving energy storage performance
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[0019] A kind of preparation method of graphene electrode material of the present invention is in, concretely implement according to the following steps:
[0020] Step 1. Prepare graphene oxide, press it into a tablet under a pressure condition of 15-18MPa by a tablet press after grinding, and obtain a graphene oxide target;
[0021] Step 2. Soak the nickel foam in dilute hydrochloric acid for 15-20 minutes, remove the surface oxide, rinse it with deionized water, and place it together with the graphene oxide target in a plasma-enhanced chemical vapor deposition vacuum device for deposition for 70- 80min, the temperature in the plasma-enhanced chemical vapor deposition vacuum device is 850°C-900°C, the pressure is 1000Pa, the radio frequency power is 100W-260W, and the gas flow rate of the protective gas is 150sccm, and the deposited graphene oxide target and Nickel foam substrate;
[0022] Step 3. Use a pulsed laser to focus the laser beam onto the deposited graphene oxide t...
Embodiment 1
[0025] The present embodiment provides a kind of preparation method of graphene electrode material, specifically implement according to the following steps:
[0026] Step 1. Prepare graphene oxide, and after grinding, press it into a tablet under a pressure condition of 15MPa by a tablet press to obtain a graphene oxide target;
[0027] Step 2. Soak the nickel foam in dilute hydrochloric acid for 15 minutes to remove the surface oxide, then rinse it with deionized water, and place it together with the graphene oxide target in a plasma-enhanced chemical vapor deposition vacuum device for 70 minutes after drying. The temperature in the enhanced chemical vapor deposition vacuum device is 850°C, the pressure is 1000Pa, the radio frequency power is 100W, and the gas flow rate of the protective gas is 150sccm, and the deposited graphene oxide target and foamed nickel substrate are obtained;
[0028] Step 3. Use a pulsed laser to focus the laser beam onto the deposited graphene oxide...
Embodiment 2
[0031] The present embodiment provides a kind of preparation method of graphene electrode material, specifically implement according to the following steps:
[0032] Step 1. Prepare graphene oxide, and after grinding, press it into a tablet under the pressure condition of 18MPa by a tablet press to obtain a graphene oxide target;
[0033] Step 2. Soak the nickel foam in dilute hydrochloric acid for 20 minutes to remove the surface oxide, then rinse it with deionized water, and after drying, place it together with the graphene oxide target in a plasma-enhanced chemical vapor deposition vacuum device for deposition for 80 minutes. The temperature in the enhanced chemical vapor deposition vacuum device is 900°C, the pressure is 1000Pa, the radio frequency power is 260W, and the gas flow rate of the protective gas is 150sccm, and the deposited graphene oxide target and foamed nickel substrate are obtained;
[0034] Step 3. Use a pulsed laser to focus the laser beam onto the deposi...
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